NASA NTRS · 19850000179
Analyzing Microchips With Dark-Field Negative Photomicrography
Abstract
Inverse development process yields fine details. Photomicrographic technique produces images of integrated-circuit chips. Technique based on dark-field illumination: (chip lit with bright central spot of light and photographed by light scattered or diffracted from spot. Reveals more about microstructure patterns related to photoresist masking than more conventional bright-field method.
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Suszko, S. F.. 1985-10-01. Analyzing Microchips With Dark-Field Negative Photomicrography. https://ntrs.nasa.gov/citations/19850000179
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