NASA NTRS ยท 19850016214
Solid/melt interface studies of high-speed silicon sheet growth
Abstract
Radial growth-rate anisotropies and limiting growth forms of point nucleated, dislocation-free silicon sheets spreading horizontally on the free surface of a silicon melt have been measured for (100), (110), (111), and (112) sheet planes. Sixteen-millimeter movie photography was used to record the growth process. Analysis of the sheet edges has lead to predicted geometries for the tip shape of unidirectional, dislocation-free, horizontally growing sheets propagating in various directions within the above-mentioned planes. Similar techniques were used to study polycrystalline sheets and dendrite propagation. For dendrites, growth rates on the order of 2.5 m/min and growth rate anisotropies on the order of 25 were measured.
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Ciszek, T. F.. 1984-02-01. Solid/melt interface studies of high-speed silicon sheet growth. https://ntrs.nasa.gov/citations/19850016214
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