NASA NTRS · 19850024118
Microwave-enhanced thin-film deposition
Abstract
The deposition of semiconducting and insulating thin films at low temperatures using microwave technology was explored. The method of plasma formations, selection of a power source, the design of the microwave plasma cavity, the microwave circuitry, impedance matching, plasma diagnostics, the deposition chamber and the vacuum system were studied.
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Chitre, S.. 1984-10-01. Microwave-enhanced thin-film deposition. https://ntrs.nasa.gov/citations/19850024118
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