Electrical coupling effects on the temporal evolution of F layer plasma structure

Abstract

A time dependent model of F region structure decay by 'classical' cross field diffusion and electrical coupling along magnetic field lines to the E region is examined. The temporal behavior of the ion concentration fluctuations is determined by the electric field in the coupled system as well as by the initial perturbation spectra and the E region recombination rate. The formation of image structure in the E region ion concentration affects the lifetime of F layer structure in a scale size dependent way. Once an image is formed, the image amplitude and the driving F region structure amplitude decay at the same rate. At large scale sizes of at least lambda(2pi/k), this rate is proportional to k2 and the ratio of the temperatures in each region. At small scale sizes it depends on the E region recombination rate and the temperatures of the two regions but is only very weakly dependent on k. The background E region concentration determines the wave number beyond which the structure amplitude decay rate is almost independent of its scale size.