NASA NTRS · 19870005850
An overview of CVD processes
Abstract
In this review, chemical vapor deposition (CVD) processes under normal or reduced pressures are examined critically, since they are now in practical usage. Several problems, which arise in much broader applications, are pointed out. New processes of CVD are also described. Superior characteristics of CVD are taken into account and they are applied in practical use.
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Okamoto, S.. 1986-08-01. An overview of CVD processes. https://ntrs.nasa.gov/citations/19870005850
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