NASA NTRS · 19880000547
Uniform Etching For Polycrystalline Photoconductor Films
Abstract
Prewetting surface overcomes problem of nonuniformity of etching often occuring in polycrystalline films at PbS and PbSe. Believed prewetting causes etchant to attack film uniformly. Because process involves wet chemistry, inexpensive and easy to use.
Keep this discovery
Explore connections, maps & timelines
Barrett, John. 1988-11-01. Uniform Etching For Polycrystalline Photoconductor Films. https://ntrs.nasa.gov/citations/19880000547
Cite the original work for its findings. Save a collection to share your selection of sources.