NASA NTRS · 19890000326
Process For Patterning Dispenser-Cathode Surfaces
Abstract
Several microfabrication techniques combined into process cutting slots 100 micrometer long and 1 to 5 micrometer wide into tungsten dispenser cathodes for traveling-wave tubes. Patterned photoresist serves as mask for etching underlying aluminum. Chemically-assisted ion-beam etching with chlorine removes exposed parts of aluminum layer. Etching with fluorine or chlorine trifluoride removes tungsten not masked by aluminum layer. Slots enable more-uniform low-work function coating dispensed to electron-emitting surface. Emission of electrons therefore becomes more uniform over cathode surface.
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Garner, Charles E., Deininger, William D.. 1989-06-01. Process For Patterning Dispenser-Cathode Surfaces. https://ntrs.nasa.gov/citations/19890000326
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