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NASA NTRS ยท 19900000207

Layered Internal-Photoemission Sensor

Abstract

High quantum efficiency achieved without multiple layer contacts. Proposed infrared sensor based on photoemission from multiple layers of metal silicide sandwiched between layers of silicon. Suitable for use in focal-plane arrays. Layered internal-photoemission sensor has positive/intrinsic/negative structure modified by inclusion of layers or islands of metal silicide. Holes photo-excited from silicide regions and swept to detection by reverse-bias electric field in intrinsic silicon. Easier to make because internal layers allowed to "float" electrically, contact being made with only two outer semiconductor layers.

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BibTeXRIS

Fathauer, Robert W.. 1990-05-01. Layered Internal-Photoemission Sensor. https://ntrs.nasa.gov/citations/19900000207

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