Materials screening chamber for testing materials resistance to atomic oxygen

Abstract

A unique test chamber for exposing material to a known flux of oxygen atoms is described. The capabilities and operating parameters of the apparatus include production of an oxygen atom flux in excess of 5 x 10 to the 16th atoms/sq cm-sec, controlled heating of the sample specimen, RF circuitry to contain the plasma within a small volume, and long exposure times. Flux measurement capabilities include a calorimetric probe and a light titration system. Accuracy and limitations of these techniques are discussed. An extension to the main chamber to allow simultaneous ultraviolet and atomic oxygen exposure is discussed. The oxygen atoms produced are at thermal energies. Sample specimens are maintained at any selected temperature between ambient and 200 C, to within + or - 2 C. A representative example of measurements made using the chamber is presented.