Ion collection from a plasma by a pinhole

Abstract

Ion focusing by a biased pinhole is studied numerically. Laplace's equation is solved in 3-D for cylindrical symmetry on a constant grid to determine the potential field produced by a biased pinhole in a dielectric material. Focusing factors are studied for ions of uniform incident velocity with a 3-D Maxwellian distribution superimposed. Ion currents to the pinhole are found by particle tracking. The focusing factor of positive ions as a function of initial velocity, temperature, injection radius, and hole size is reported. For a typical Space Station Freedom environment (oxygen ions having a 4.5 eV ram energy, 0.1 eV temperature, and a -140 V biased pinhole), a focusing factor of 13.35 is found for a 1.5 mm radius pinhole.