NASA NTRS · 19920016156
Metal etching composition
Abstract
The present invention is directed to a chemical etching composition for etching metals or metallic alloys. The composition includes a solution of hydrochloric acid, phosphoric acid, ethylene glycol, and an oxidizing agent. The etching composition is particularly useful for etching metal surfaces in preparation for subsequent fluorescent penetrant inspection.
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Otousa, Joseph E., Thomas, Clark S., Foster, Robert E.. 1991-07-23. Metal etching composition. https://ntrs.nasa.gov/citations/19920016156
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