NASA NTRS · 19940000007
Making CoSi(2) Layers By Ion Implantation
Abstract
Monolithic photovoltaic batteries containing vertical cells include buried CoSi(2) contact layers. Vertical-junction photovoltaic cells in series fabricated in monolithic structure. N- and p-doped silicon layers deposited epitaxially. The CoSi(2) layers, formed by ion implantation and annealing, serve as thin, low-resistance ohmic contacts between cells.
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Namavar, Fereydoon. 1994-01-01. Making CoSi(2) Layers By Ion Implantation. https://ntrs.nasa.gov/citations/19940000007
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