Floating gate dosimetry based on differential charge injection

Scheick, Leif Z.; McNulty, P. J.

NASA NTRS · 20060044255

Floating gate dosimetry based on differential charge injection

Scheick, Leif Z.·McNulty, P. J.

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Floating gate Avalanche Metal Oxide Semiconductor (FAMOS)Microdosimetry Floating Gate Dosimetry

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Scheick, Leif Z., McNulty, P. J.. 2001-07-16. Floating gate dosimetry based on differential charge injection. https://ntrs.nasa.gov/citations/20060044255

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