Comparative Mirror Cleaning Study: 'A Study on Removing Particulate Contamination'

Abstract

The cleanliness of optical surfaces is recognized as an industry-wide concern for the performance of optical devices such as mirrors and telescopes, microscopes and lenses, lasers and interferometers, and prisms and optical filters. However, no standard has been established for optical cleaning and there is no standard definition of a 'clean' optical element. This study evaluates the effectiveness of commonly used optical cleaning techniques based on wafer configuration, contamination levels, and the number and size of removed particles. It is concluded that cleaning method and exposure time play a significant factor in obtaining a high removal percentage. The detergent bath and solvent rinse method displayed an increase in effective removal percentage as the contamination exposure increased. Likewise, CO2 snow cleaning showed a relatively consistent cleaning effectiveness. The results can help ensure mission success to flight projects developed for the NASA Origins Program. Advantages and disadvantages of each of the optical cleaning methods are described.