NASA NTRS · 20090006603
Method for implementation of back-illuminated CMOS or CCD imagers
Abstract
A method for implementation of back-illuminated CMOS or CCD imagers. An oxide layer buried between silicon wafer and device silicon is provided. The oxide layer forms a passivation layer in the imaging structure. A device layer and interlayer dielectric are formed, and the silicon wafer is removed to expose the oxide layer.
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Pain, Bedabrata. 2008-09-16. Method for implementation of back-illuminated CMOS or CCD imagers. https://ntrs.nasa.gov/citations/20090006603
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