NASA NTRS · 20120013764
Enabling High Performance Instruments for UV Astronomy and Space Exploration with ALD
Abstract
Benefits of Atomic Layer Deposition (ALD) for UV instruments and application are: (1) Ultrathin, highly conformal, and uniform films over arbitrarily large surface area (2) High quality films (density, roughness, conductivity, etc.) (3) Angstrom level control of stoichiometry, interfaces, and surface properties (3a) Multilayer nanolaminates/nanocomposites (3b) Low temperature surface engineering UV flight applications enabled by ALD. (1) Anti -reflective coatings/Mirrors/Filters/Optics for UV/Vis/NIR Detectors (2) Surface Passivation for III -N detectors
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Greer, F., Hoenk, M. E., Jones, T. J., Jacquot, B. C., Monacos, S., Nikzad, S., Hamden, E., Schiminovich, D.. 2011-06-27. Enabling High Performance Instruments for UV Astronomy and Space Exploration with ALD. https://ntrs.nasa.gov/citations/20120013764
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