An Introduction to Atomic Layer Deposition with Thermal Applications

Dwivedi, Vivek H.

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NASA NTRS · 20150018281

An Introduction to Atomic Layer Deposition with Thermal Applications

Dwivedi, Vivek H.

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Abstract

Atomic Layer Deposition (ALD) is a cost effective nano-manufacturing technique that allows for the conformal coating of substrates with atomic control in a benign temperature and pressure environment. Through the introduction of paired precursor gases thin films can be deposited on a myriad of substrates ranging from glass, polymers, aerogels, and metals to high aspect ratio geometries. This talk will focus on the utilization of ALD for engineering applications.

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BibTeX RIS

Dwivedi, Vivek H.. 2015-08-03. An Introduction to Atomic Layer Deposition with Thermal Applications. https://ntrs.nasa.gov/citations/20150018281

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