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NASA NTRS · 20210005802

Mirror coatings with atomic layer deposition : initial results

Abstract

The new technology of Atomic Layer Deposition (ALD) holds promise to enable a future strategic mission that can address both ultraviolet (UV) astrophysics and optical exoplanet science with a shared telescope. The technology path to a shared telescope requires the development of a mirror coating with high reflectance from 100 nm to 1000 nm, and low polarization effects (i.e., s-p phase shifts that can vary with angle of incidence across a primary and secondary mirror) in the optical range. Currently, UV coatings have low reflectance, and conventional optical coatings have poor polarization properties for high-contrast coronagraph applications. In this paper we attempt to take a first step toward solving both problems simultaneously by using ALD, taking advantage of the fact that ALD can potentially produce mirror coatings with denser layers than conventional coatings (hence better reflectance, durability, and water resistance). In addition, ALD can potentially produce coatings with new composite materials (hence better control of polarization). We report here the results of our initial experiments with mirror coatings using ALD.

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BibTeXRIS

Traub, Wesley, Nikzad, Shouleh, Greer, Frank. 2012-07-01. Mirror coatings with atomic layer deposition : initial results. https://ntrs.nasa.gov/citations/20210005802

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