EME 192 Report

Abstract

I spent the quarter working in Lawrence Livermore National Laboratory’s (LLNL) Materials Engineering Division. The group I have been working with (I’ve been here for two summers already) focuses on advanced manufacturing techniques such as stereolithography, electrophoretic deposition, and the printing of silicon based inks. Part of the goal of what is done in our group is to create designer materials not by altering the composition but by altering the micro-architecture. Our technology can create shapes that are not possible with traditional manufacturing techniques. This allows us to create structures that are light, yet very strong and stiff. It also allows us to create materials with property gradients. In other words, we can make structures and parts that are stronger in some locations than others. I have been working with electrophoretic deposition for the duration of my stay and have focused on advancing the technology from a thin-film technique to a true additive manufacturing paradigm. Put succinctly, electrophoretic deposition is the deposition of particles in suspension with electric fields. Particles have a potential on the surface which allows them to be driven to an electrode using an electric field. The particles then deposit onto the conductive regions of the substrate, traditionally, the entire surface. Electrophoretic deposition is powerful in that it can handle a wide variety of materials (ceramics, metals, bacteria), create material gradients in the deposits, and create layered deposition of multiple materials. A drawback of traditional electrophoretic deposition is that patterned deposits are only possible with a non-reconfigurable patterned electrode. A technique was developed at LLNL that allows for the arbitrary patterning of the electric field using photoconductive electrodes and light. This way, you can create interesting shapes and reconfigure the pattern of the deposit using the same electrode. A photoconductive electrode is made by hydrothermally growing titania nanorods onto a transparent current collector. A photomask is used to block incoming some light and only allow the desired pattern of light through. The photoconductive electrode then activates when and where the light hits, once an electric field is applied. Particles will migrate to the areas of illumation and deposit.