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DOE OSTI · 1395991

Profile etching for prefiguring X-ray mirrors

Liu, Chian·Qian, Jun·Assoufid, Lahsen
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Abstract

A method to pre-shape mirror substrates through etching with a broad-beam ion source and a contoured mask is presented. A 100 mm-long elliptical cylinder substrate was obtained from a super-polished flat Si substrate with a 48 nm root-mean-square (r.m.s.) figure error and a 1.5 Å r.m.s. roughness after one profile-etching process at a beam voltage of 600 V without iteration. A follow-up profile coating can be used to achieve a final mirror. Profile etching and profile coating combined provide an economic way to make X-ray optics, such as nested Kirkpatrick–Baez mirrors.

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73 NUCLEAR PHYSICS AND RADIATION PHYSICSBroad beam ion figuringion etchingKB mirrorsprofile coating

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Liu, Chian, Qian, Jun, Assoufid, Lahsen. 2015-02-04. Profile etching for prefiguring X-ray mirrors. https://doi.org/10.1107/s1600577515000624

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