DOE OSTI · 1632154
Fast nonthermal processes in pulsed laser deposition
Abstract
Pulsed laser deposition (PLD) is typically used to grow epitaxial thin films of quantum materials. In this research, we use in situ x-ray scattering to study homoepitaxy of SrTiO 3 by energetic deposition (e-PLD) versus PLD thermalized by a He background gas (th-PLD). Energetic PLD suppresses the lateral growth of two-dimensional islands, which suggests that particles with kinetic energies of ~ 100 eV break up smaller islands. Fast interlayer transport occurs for th-PLD as well as e-PLD, implying a process operating on submicrosecond time scales for incident particles with kinetic energies below 10 eV.
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Ulbrandt, Jeffrey G., Zhang, Xiaozhi, Headrick, Randall L., Liu, Rui, Dawber, Matthew, Evans-Lutterodt, Kenneth. 2020-06-01. Fast nonthermal processes in pulsed laser deposition. https://doi.org/10.1103/physrevb.101.241406
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