DOE OSTI · 1694969
Materials Data on Ni(ClO2)2 by Materials Project
Abstract
NiO4NiCl4NiO4ClO2ClO2 crystallizes in the triclinic P1 space group. The structure is zero-dimensional and consists of one 67952-07-2 molecule, one oxygen molecule, one NiCl4 cluster, one NiO4 cluster, and one NiO4Cl cluster. In the NiCl4 cluster, Ni is bonded in a tetrahedral geometry to four Cl atoms. There are three shorter (2.16 Å) and one longer (2.19 Å) Ni–Cl bond lengths. There are four inequivalent Cl sites. In the first Cl site, Cl is bonded in a single-bond geometry to one Ni atom. In the second Cl site, Cl is bonded in a single-bond geometry to one Ni atom. In the third Cl site, Cl is bonded in a single-bond geometry to one Ni atom. In the fourth Cl site, Cl is bonded in a single-bond geometry to one Ni atom. In the NiO4 cluster, Ni is bonded in a trigonal planar geometry to three O atoms. There is two shorter (1.60 Å) and one longer (1.95 Å) Ni–O bond length. There are four inequivalent O sites. In the first O site, O is bonded in a distorted bent 120 degrees geometry to one Ni and one O atom. The O–O bond length is 1.25 Å. In the second O site, O is bonded in a single-bond geometry to one O atom. In the third O site, O is bonded in a single-bond geometry to one Ni atom. In the fourth O site, O is bonded in a single-bond geometry to one Ni atom. In the NiO4Cl cluster, Ni is bonded in a T-shaped geometry to three O atoms. There are a spread of Ni–O bond distances ranging from 1.76–2.04 Å. There are four inequivalent O sites. In the first O site, O is bonded in a single-bond geometry to one O atom. The O–O bond length is 1.24 Å. In the second O site, O is bonded in a bent 120 degrees geometry to one Ni and one O atom. In the third O site, O is bonded in a single-bond geometry to one Ni atom. In the fourth O site, O is bonded in a bent 120 degrees geometry to one Ni and one Cl atom. The O–Cl bond length is 1.62 Å. Cl is bonded in a single-bond geometry to one O atom.
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2020-05-01. Materials Data on Ni(ClO2)2 by Materials Project. https://doi.org/10.17188/1694969
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