Complex Formation and Dissociation Dynamics on Amorphous Silica Surfaces

Abstract

Benzene complex formation and dissociation dynamics with silanols on the amorphous silica surfaces of nanoporous SiO 2 , from a benzene/carbon tetrachloride solution, were measured by the growth of off-diagonal peaks in the two dimensional infrared (2D IR) chemical exchange spectrum of the isolated Si-OD stretch. The presence of two types of isolated silanols, referred to as type I and II, was revealed, with dissociation time constants of 82 ps and 4.0 ps for type I and II complexes, respectively. The type I silanols are associated with the main IR absorption feature in the Si-OD stretching region, while the type II silanols give rise to a broader shoulder to lower frequency. Polarization selective pump-probe (PSPP) measurements provided the vibrational lifetimes and orientational relaxation rates of the two silanols in the CCl 4 (free) and benzene (complex) environments. The type II silanols constitute roughly 30% of the isolated silanol population and exhibit a substantially faster rate of vibrational relaxation, making the type I dynamics the dominant contribution to the PSPP and 2D IR signals. From the measured dissociation times, the enthalpies of formation for the two surface complexes were obtained; the formation of the type I complex being significantly more exothermic. Furthermore, as the type II site is preferentially removed from the amorphous silica surface with increasing activation temperature, the results provide a reasonable explanation for the increased exothermicity of benzene adsorption on silica with increasing activation temperature in previous calorimetry experiments.