Dual wavelength negative imaging DLP-SLA system

Abstract

The present disclosure relates to a digital light projector (DLP) system which has first and second light sources. The first optical source may generate a first beam at a first wavelength which causes polymerization of a photopolymerizable resist. The second optical source may generate a second beam at a second wavelength different from the first wavelength, and where the second beam inhibits polymerization of the photopolymerizable resist. A digital micromirror device (DMD) is included which has a plurality of micromirrors and is configured to be illuminated by the first and second beams and to generate a pattern on the micromirrors which has light from the first and second light wavelengths controlled by the micromirror position. The first light image causes polymerization of a first portion of the photopolymerizable resist, while the second image inhibits polymerization of a second portion of the photopolymerizable resist.