The 2022 Plasma Roadmap: low temperature plasma science and technology

Adamovich, I. (ORCID:0000000163113940); Agarwal, S.; Ahedo, E. (ORCID:0000000321484553); Alves, L. L. (ORCID:000000022677574X); Baalrud, S. (ORCID:0000000196412605); Babaeva, N. (ORCID:0000000237628542); Bogaerts, A. (ORCID:0000000198756460); Bourdon, A. (ORCID:0000000336624651); Bruggeman, P. J. (ORCID:0000000333467275); Canal, C.; Choi, E. H.; Coulombe, S. (ORCID:000000019521181X); Donkó, Z. (ORCID:0000000313696150); Graves, D. B. (ORCID:0000000222886768); Hamaguchi, S. (ORCID:0000000165808797); Hegemann, D. (ORCID:0000000342269326); Hori, M.; Kim, H-H (ORCID:000000024641524X); Kroesen, G. M. W.; Kushner, M. J. (ORCID:0000000174378573); Laricchiuta, A. (ORCID:0000000267527419); Li, X. (ORCID:0000000168233335); Magin, T. E.; Mededovic Thagard, S.; Miller, V.; Murphy, A. B. (ORCID:0000000228202304); Oehrlein, G. S. (ORCID:0000000266934274); Puac, N.; Sankaran, R. M.; Samukawa, S. (ORCID:0000000349713290); Shiratani, M. (ORCID:0000000241033939); Šimek, M. (ORCID:0000000317308493); Tarasenko, N. (ORCID:0000000222229389); Terashima, K. (ORCID:0000000322832396); Thomas Jr, E. (ORCID:0000000277470284); Trieschmann, J. (ORCID:0000000191368019); Tsikata, S. (ORCID:0000000151040676); Turner, M. M. (ORCID:0000000197136198); van der Walt, I. J.; van de Sanden, M. C. M.; von Woedtke, T. (ORCID:0000000210974832)

doi:10.1088/1361-6463/ac5e1c

DOE OSTI · 1874842

The 2022 Plasma Roadmap: low temperature plasma science and technology

Adamovich, I. (ORCID:0000000163113940)·Agarwal, S.·Ahedo, E. (ORCID:0000000321484553)·Alves, L. L. (ORCID:000000022677574X)·Baalrud, S. (ORCID:0000000196412605)·Babaeva, N. (ORCID:0000000237628542)·Bogaerts, A. (ORCID:0000000198756460)·Bourdon, A. (ORCID:0000000336624651)·Bruggeman, P. J. (ORCID:0000000333467275)·Canal, C.·Choi, E. H.·Coulombe, S. (ORCID:000000019521181X)·Donkó, Z. (ORCID:0000000313696150)·Graves, D. B. (ORCID:0000000222886768)·Hamaguchi, S. (ORCID:0000000165808797)·Hegemann, D. (ORCID:0000000342269326)·Hori, M.·Kim, H-H (ORCID:000000024641524X)·Kroesen, G. M. W.·Kushner, M. J. (ORCID:0000000174378573)·Laricchiuta, A. (ORCID:0000000267527419)·Li, X. (ORCID:0000000168233335)·Magin, T. E.·Mededovic Thagard, S.·Miller, V.·Murphy, A. B. (ORCID:0000000228202304)·Oehrlein, G. S. (ORCID:0000000266934274)·Puac, N.·Sankaran, R. M.·Samukawa, S. (ORCID:0000000349713290)·Shiratani, M. (ORCID:0000000241033939)·Šimek, M. (ORCID:0000000317308493)·Tarasenko, N. (ORCID:0000000222229389)·Terashima, K. (ORCID:0000000322832396)·Thomas Jr, E. (ORCID:0000000277470284)·Trieschmann, J. (ORCID:0000000191368019)·Tsikata, S. (ORCID:0000000151040676)·Turner, M. M. (ORCID:0000000197136198)·van der Walt, I. J.·van de Sanden, M. C. M.·von Woedtke, T. (ORCID:0000000210974832)

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Abstract

Abstract The 2022 Roadmap is the next update in the series of Plasma Roadmaps published by Journal of Physics D with the intent to identify important outstanding challenges in the field of low-temperature plasma (LTP) physics and technology. The format of the Roadmap is the same as the previous Roadmaps representing the visions of 41 leading experts representing 21 countries and five continents in the various sub-fields of LTP science and technology. In recognition of the evolution in the field, several new topics have been introduced or given more prominence. These new topics and emphasis highlight increased interests in plasma-enabled additive manufacturing, soft materials, electrification of chemical conversions, plasma propulsion, extreme plasma regimes, plasmas in hypersonics, data-driven plasma science and technology and the contribution of LTP to combat COVID-19. In the last few decades, LTP science and technology has made a tremendously positive impact on our society. It is our hope that this roadmap will help continue this excellent track record over the next 5–10 years.

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plasma diagnostics 70 PLASMA PHYSICS AND FUSION TECHNOLOGY low temperature plasma plasma applications plasma material processing plasma modeling plasma science and technology roadmap

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Adamovich, I. (ORCID:0000000163113940), Agarwal, S., Ahedo, E. (ORCID:0000000321484553), Alves, L. L. (ORCID:000000022677574X), Baalrud, S. (ORCID:0000000196412605), Babaeva, N. (ORCID:0000000237628542), Bogaerts, A. (ORCID:0000000198756460), Bourdon, A. (ORCID:0000000336624651), Bruggeman, P. J. (ORCID:0000000333467275), Canal, C., Choi, E. H., Coulombe, S. (ORCID:000000019521181X), Donkó, Z. (ORCID:0000000313696150), Graves, D. B. (ORCID:0000000222886768), Hamaguchi, S. (ORCID:0000000165808797), Hegemann, D. (ORCID:0000000342269326), Hori, M., Kim, H-H (ORCID:000000024641524X), Kroesen, G. M. W., Kushner, M. J. (ORCID:0000000174378573), Laricchiuta, A. (ORCID:0000000267527419), Li, X. (ORCID:0000000168233335), Magin, T. E., Mededovic Thagard, S., Miller, V., Murphy, A. B. (ORCID:0000000228202304), Oehrlein, G. S. (ORCID:0000000266934274), Puac, N., Sankaran, R. M., Samukawa, S. (ORCID:0000000349713290), Shiratani, M. (ORCID:0000000241033939), Šimek, M. (ORCID:0000000317308493), Tarasenko, N. (ORCID:0000000222229389), Terashima, K. (ORCID:0000000322832396), Thomas Jr, E. (ORCID:0000000277470284), Trieschmann, J. (ORCID:0000000191368019), Tsikata, S. (ORCID:0000000151040676), Turner, M. M. (ORCID:0000000197136198), van der Walt, I. J., van de Sanden, M. C. M., von Woedtke, T. (ORCID:0000000210974832). 2022-07-05. The 2022 Plasma Roadmap: low temperature plasma science and technology. https://doi.org/10.1088/1361-6463%2Fac5e1c

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