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Ion Number Density Quantification Utilizing Pulsing Frequency in Negative Differential Resistance (NDR) Regime of Microplasma Operation

Mahamud, Rajib·Farouk, Tanvir
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Abstract

A mathematical model is presented for quantifying the ion number density over a range of discharge current in microplasma discharges. The ion number density is determined from measured discharge voltage, current, pulsing frequency, and trace impurity that is injected into the system deliberately. Experiments are conducted in pure helium with nitrogen being introduced as the trace species. The ion number density is estimated over a range of discharge current and is compared with multidimensional simulation results.

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70 PLASMA PHYSICS AND FUSION TECHNOLOGYNDRion number densitymicroplasmanegative differential resistancepulsing frequency

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Mahamud, Rajib, Farouk, Tanvir. 2020-07-15. Ion Number Density Quantification Utilizing Pulsing Frequency in Negative Differential Resistance (NDR) Regime of Microplasma Operation. https://doi.org/10.1109/tps.2020.3005882

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