Surface plasma source with anode layer plasma accelerator

Abstract

Proposed plasma generation system can be used for high current negative ion beam production and for directed deposition by flux of sputtered neutrals and negative ions. The main mechanism of negative ion formation in surface plasma sources is the secondary emission from low work function surface bombarded by a flux of positive ion or neutrals. The emission of negative ions is enhanced significantly by introducing a small amount of cesium or other substance with low ionization potential. In the proposed source are used positive ions generated by Hall drift plasma accelerator (anode layer plasma accelerator or plasma accelerator with insulated channel, with cylindrical or race track configuration of emission slit). The target-emitter is bombarded by the ion beam accelerated in crossed ExB fields. Negative ions are extracted from the target surface with geometrical focusing and are accelerated by negative voltage applied between emitter and plasma, contacting with the plasma accelerator. Hall drift ion source has a special design with a space for passing of the emitted negative ions and sputtered particles through the positive ion source.