DOE OSTI · 2278934
Nonvolatile Memristive Effect in Few-Layer CrI 3 Driven by Electrostatic Gating
Abstract
The potential of memristive devices for applications in nonvolatile memory and neuromorphic computing has sparked considerable interest, particularly in exploring memristive effects in two-dimensional (2D) magnetic materials. However, the progress in developing nonvolatile, magnetic field-free memristive devices using 2D magnets has been limited. In this work, we report an electrostatic-gating-induced nonvolatile memristive effect in CrI 3 -based tunnel junctions. The few-layer CrI 3 -based tunnel junction manifests notable hysteresis in its tunneling resistance as a function of gate voltage. We further engineered a nonvolatile memristor using the CrI 3 tunneling junction with low writing power and at zero magnetic field. We show that the hysteretic transport observed is not a result of trivial effects or inherent magnetic properties of CrI 3 . We propose a potential association between the memristive effect and the newly predicted ferroelectricity in CrI 3 via gating-induced Jahn–Teller distortion. Furthermore, our work illuminates the potential of 2D magnets in developing next-generation advanced computing technologies.
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Fu, ZhuangEn, Samarawickrama, Piumi I., Zhu, Yanglin, Mao, Zhiqiang, Wang, Wenyong, Watanabe, Kenji, Taniguchi, Takashi, Tang, Jinke, Ackerman, John, Tian, Jifa. 2023-12-11. Nonvolatile Memristive Effect in Few-Layer CrI 3 Driven by Electrostatic Gating. https://doi.org/10.1021/acs.nanolett.3c03926
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