DOE OSTI · 2293967
Dual wavelength negative imaging DLP-SLA system and method
Abstract
The present disclosure relates to a method for forming a three dimensional (3D) component from a photopolymer resin. The method may involve generating a first optical beam at a first wavelength, with the first optical beam causing polymerization of a photopolymerizable resist. A second optical beam is generated at a second wavelength, different from the first wavelength, which inhibits polymerization of the photopolymerizable resist. A device is used to receive the first and second optical beams and to generate therefrom corresponding separate first and second light patterns, respectively, where the first light pattern forms a first image on the photopolymerizable resist to cause polymerization of a first portion of the photopolymerizable resist, while the second light pattern forms a second image on the photopolymerizable resist and inhibits polymerization of a second portion of the photopolymerizable resist.
Keep this discovery
Explore connections, maps & timelines
Moran, Bryan D.. 2023-12-12. Dual wavelength negative imaging DLP-SLA system and method. https://www.osti.gov/biblio/2293967
Cite the original work for its findings. Save a collection to share your selection of sources.