Manufacturability-based optical design optimization for advanced Kirkpatrick–Baez X-ray focusing mirrors

Abstract

The advanced Kirkpatrick–Baez (AKB) mirror setup is an effective and compelling solution to provide stable X-ray nano-focusing for synchrotron radiation or free-electron laser beamlines. We propose an AKB mirror design optimization approach to mitigate the difficulties associated with mirror fabrication by minimizing the total slope ranges of the four curved mirrors while achieving the expected focusing performance. In the optimization, we have considered geometry constraints to ensure the beam acceptance with the required clear aperture, the diffraction-limited focal size with the adequate numerical aperture, and the desired mirror gaps for adjustment and the necessary working distance for the sample stage. Additionally, practical constraints linked to mirror metrology and fabrication, such as mirror length limits and curvature uncertainty in measurement, are taken into account. Furthermore, progressive objective optimization eliminates the need for any initial guess, fully automating the AKB optimization process. This approach facilitates the development of an elegant Wolter-I or Wolter-III type AKB design solution that satisfies these multiple constraints. In cases where constraints cannot be simultaneously satisfied, the optimization results provide valuable insights into areas where trade-offs need to be considered. Simulations with ray tracing and wavefront propagation validate the optimized AKB design showing high tolerance to the beam incident angle.