DOE OSTI · 2538713
Atomistic investigation of diffusion processes at Al(Si)/Si(111) interphase boundaries obtained by simulated vapor deposition
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Li, Yang (ORCID:0000000311710852), Koju, Raj K. (ORCID:0000000197992103), Mishin, Yuri (ORCID:000000017299433X). 2025-05-01. Atomistic investigation of diffusion processes at Al(Si)/Si(111) interphase boundaries obtained by simulated vapor deposition. https://doi.org/10.1016/j.actamat.2025.120937
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