Performance Improvement of LTS Undulators for Synchrotron Light Sources

Abstract

The joint expertise of ANL and FNAL has led to the production of $\text{Nb}_{3}\text{Sn}$ undulator magnets in operation in the ANL Advanced Photon Source (APS). These magnets showed performance reproducibility close to the short sample limit, and a design field increase of 20% at 820 A. However, the long training did not allow obtaining the expected 50% increase of the on-axis magnetic field with respect to the ∼1 T produced at 450 A current in the ANL NbTi undulator. To address this, 10-pole long undulator prototypes were fabricated, and CTD-101K was replaced as impregnation material with TELENE, an organic olefin-based thermosetting dicyclopentadiene resin produced by RIMTEC Corporation, Japan. Training and magnet retraining after a thermal cycle were nearly eliminated, with only a couple of quenches needed before reaching short sample limit at over 1,100 A. TELENE will enable operation of $\text{Nb}_{3}\text{Sn}$ undulators much closer to their short sample limit, expanding the energy range and brightness intensity of light sources. TELENE is Co-60 gamma radiation resistant up to 7–8 MGy, and therefore already applicable to impregnate planar, helical and universal devices operating in lower radiation environments than high energy colliders.