Atomistic modeling of the structure and diffusion processes at Al(110)/Si(001) interphase boundaries obtained by vapor deposition

Li, Yang (ORCID:0000000311710852); Mishin, Yuri (ORCID:000000017299433X)

doi:10.1103/physrevmaterials.9.053401

DOE OSTI · 2565095

Atomistic modeling of the structure and diffusion processes at Al(110)/Si(001) interphase boundaries obtained by vapor deposition

Li, Yang (ORCID:0000000311710852)·Mishin, Yuri (ORCID:000000017299433X)

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Li, Yang (ORCID:0000000311710852), Mishin, Yuri (ORCID:000000017299433X). 2025-05-08. Atomistic modeling of the structure and diffusion processes at Al(110)/Si(001) interphase boundaries obtained by vapor deposition. https://doi.org/10.1103/physrevmaterials.9.053401

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