DOE OSTI · 2999101
Low Temperature Tantalum Electrodeposition: Enabling Next Generation Coatings
Abstract
This project aimed to identify the ligand and solvation conditions necessary for the electrodeposition of refractory metals from low-temperature organic electrolytes. Tantalum (Ta) was chosen as a specific exemplar for programmatic purposes. It was hoped that a deeper understanding of these relationships could facilitate the innovative application of refractory metal coatings on thermally sensitive and geometrically intricate components used in extreme environments related to energy generation and storage, nuclear deterrence, aerospace, defense, and beyond.
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Watkins, Tylan [Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)] (ORCID:0000000346021125), Hahn, Nathan [Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)] (ORCID:0000000161874068), Urena, Michael Earl [Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)] (ORCID:0009000252120197). 2026-09-01. Low Temperature Tantalum Electrodeposition: Enabling Next Generation Coatings. https://doi.org/10.2172/2999101
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