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DOE OSTI · 3010726

Anodic Dissolution Rates Accelerate with Decreasing MoS 2 Nanoflake Thickness

Toole, Justin R.·Sambur, Justin B.
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Abstract

Electrochemical gating of 2D transition metal dichalcogenide (TMD) electrodes is an emerging frontier in the field of semiconductor electrochemistry. In this approach, an applied bias modifies the charge carrier concentration of the 2D TMD, causing band edge shifts and drastic changes in charge transfer rates. However, leveraging this effect for (photo)electrocatalysis is practically limited by the stability of the TMD material under gating conditions. Gerischer showed anodic dissolution of bulk TMD electrodes can occur in the dark and hypothesized that the reaction proceeds via an electron tunneling mechanism from surface states to the TMD conduction band [H. Gerischer, D. Ross, and M. Lubke, Z. Physickalische Chem., 139, 1 (1984)]. Here we investigate this possibility in single MoS 2 nanoflakes using in situ optical microscopy and explore whether Gerischer’s electron tunneling mechanism can explain anodic dissolution rates of thin 2D semiconductors. Here, spatially resolved measurements show anodic dissolution initiates at perimeter edge sites and accelerates exponentially with decreasing layer thickness, consistent with Gerischer’s tunneling mechanism. Interestingly, single layer MoS 2 is impervious to anodic dissolution at applied potentials >200 mV more positive than those required to drive dissolution in bulk and multilayer-thick nanoflakes.

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2D semiconductorcorrosionelectrooxidationelectrostatic gatingmolybdenum disulfidetransition metal disulfidetunneling

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Toole, Justin R., Sambur, Justin B.. 2023-11-14. Anodic Dissolution Rates Accelerate with Decreasing MoS 2 Nanoflake Thickness. https://doi.org/10.1149/1945-7111%2Fad091a

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