DOE OSTI · 3020502
Predicting U 3 O 8 powder processing conditions: An AI/ML approach analyzing deep learning embeddings of SEM micrographs
Abstract
High-resolution SEM images of uranium-oxide powders encode micro- and nanoscale clues to their synthesis route and calcination temperature. We trained a ResNet-50 model on 11 commercial-scale U₃O₈ classes, ammonium diuranate (ADU) or uranyl peroxide (H₂O₂) precursors calcined at temperatures ranging from 400 to 750 °C and added a 256-D projection head before the classifier to analyze the learned representation. The best of eight seeds reached 92.4 % accuracy on reserved testing data, but our focus is the structure of the embedding space rather than the accuracy and labels. We quantify class relatedness in the original 256-D space using centroid similarity and distributional distances, and we use Uniform Manifold Approximation Projection (UMAP) for visualization. ‘Unknown’ images from different preparation methods, SEM operators, and from the literature localized near the expected classes under a nearest-centroid analysis without retraining, as well as clustered in similar UMAP space. In conclusion, this embedding-centered workflow complements black-box classification by providing quantitative, similarity-based comparisons of U₃O₈ morphologies and reduces storage space by up to 98 % for image data used in millisecond vector search comparisons.
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Boro, Joseph [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)] (ORCID:0000000209940272), Griffin, Alizé [Univ. of California, Los Angeles, CA (United States)], Aitkaliyeva, Assel [Univ. of Florida, Gainesville, FL (United States)] (ORCID:0000000314816804), Caseres, Jen [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)], Maina, Ouyanatu [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)], Marks, Naomi [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)]. 2026-01-08. Predicting U 3 O 8 powder processing conditions: An AI/ML approach analyzing deep learning embeddings of SEM micrographs. https://doi.org/10.1016/j.jallcom.2026.186054
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