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DOE OSTI · 3027531

Optimized manufacturing process for multilayer two-dimensional focusing mirrors in laboratory X-ray applications

Abstract

Recent advances in laboratory X-ray applications require high-performance optical components that achieve exceptional imaging resolution and beam uniformity within compact experimental setups. Montel mirrors have become a preferred solution due to their unique dual-reflection focusing mechanism and a space-efficient design. Here, in this study, we present an effective manufacturing process for producing Montel mirrors tailored to focus laboratory X-ray beams. The mirrors were fabricated from single-crystal silicon substrates, chosen for their high mechanical stability and compatibility with precision polishing techniques. Our approach begins with the integration of a deterministic chemo-mechanical polishing (CMP)-based pre-shaping step followed by ion beam figuring (IBF), significantly improving manufacturing efficiency. Subsequently, our custom-developed advanced metrology and IBF techniques were employed for fabricating an off-axis, elliptical cylinder Montel mirror system with a 6-mrad total slope, with stringent optical specifications. While post-IBF processes, including multilayer coating, dicing, and gluing, introduced minor surface errors, yet their impact on performance remained negligible. The Montel mirrors manufactured with the optimized process exhibited significantly improved beam uniformity and a reduced focal spot size. These findings validate our approach as a viable solution for high-precision Montel mirror fabrication and facilitate further advancements in laboratory X-ray applications.

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BibTeXRIS

Wang, Tianyi [Brookhaven National Laboratory (BNL), Upton, NY (United States). National Synchrotron Light Source II (NSLS-II)] (ORCID:0000000168808194), Lyu, Mingda [Rigaku Innovative Technologies, Auburn Hills, MI (United States)], Huang, Lei [Brookhaven National Laboratory (BNL), Upton, NY (United States). National Synchrotron Light Source II (NSLS-II)] (ORCID:0000000256455173), Clarkston, Brian [Rigaku Innovative Technologies, Auburn Hills, MI (United States)], Kim, Bonglea [Rigaku Innovative Technologies, Auburn Hills, MI (United States)], Platonov, Yuriy [Rigaku Innovative Technologies, Auburn Hills, MI (United States)], Grupido, Nick [Rigaku Innovative Technologies, Auburn Hills, MI (United States)], Jiang, Licai [Rigaku Innovative Technologies, Auburn Hills, MI (United States)], Austin, Corey [Brookhaven National Laboratory (BNL), Upton, NY (United States). National Synchrotron Light Source II (NSLS-II)] (ORCID:0000000154889480), Idir, Mourad [Brookhaven National Laboratory (BNL), Upton, NY (United States). National Synchrotron Light Source II (NSLS-II)] (ORCID:0000000333017274). 2026-03-09. Optimized manufacturing process for multilayer two-dimensional focusing mirrors in laboratory X-ray applications. https://doi.org/10.1016/j.jmapro.2026.03.003

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36 MATERIALS SCIENCE↗