DOE OSTI · 3374523
LaueMatching: an approach for rapid and robust indexing of Laue diffraction patterns
Abstract
Traditional Laue diffraction pattern indexing often struggles with noisy data, weak signals, peak overlap and missing reflections, particularly from complex or deformed microstructures. Here, we introduce LaueMatching, a high-throughput indexing algorithm designed to overcome these limitations. LaueMatching utilizes a fundamentally different approach based on direct pattern correlation: experimentally pre-processed images are compared against a comprehensive pre-computed library of simulated diffraction patterns corresponding to a dense grid of possible orientations. This approach bypasses the need for explicit peak identification and fitting, steps that are often a failure point for traditional methods. The algorithm rapidly and robustly indexes multiple crystallographic orientations and crystal systems simultaneously, even from challenging patterns. LaueMatching's effectiveness and accuracy have been rigorously tested and validated on diverse experimental (Ni, Al, EuAl 2 O 4 ) and simulated diffraction patterns, demonstrating high-fidelity orientation refinement. Code to implement this approach on both CPU and GPU resources can be downloaded from https://github.com/AdvancedPhotonSource/LaueMatching.
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Sharma, Hemant [Argonne National Laboratory (ANL), Lemont, IL (United States). Advanced Photon Source (APS)] (ORCID:0000000208009275), Sheyfer, Dina [Argonne National Laboratory (ANL), Lemont, IL (United States). Advanced Photon Source (APS)], Harder, Ross [Argonne National Laboratory (ANL), Lemont, IL (United States). Advanced Photon Source (APS)], Tischler, Jonathan Z. [Argonne National Laboratory (ANL), Lemont, IL (United States). Advanced Photon Source (APS)] (ORCID:0000000161637505). 2026-03-11. LaueMatching: an approach for rapid and robust indexing of Laue diffraction patterns. https://doi.org/10.1107/s1600576726001196
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