RF Processing Experience with the GTF Prototype RF Gun

Abstract

The SSRL Gun Test Facility (GTF) was built to develop a high brightness electron injector for the LCLS and has been operational since 1996. A total of five different metal cathodes (4 Cu and 1 Mg) have been installed on the GTF gun. The rf processing history with the different cathodes will be presented including peak field achieved at the cathode. The LCLS gun is intended to operate at 120 MV/m and fields up to 140 MV/m have been achieved in the GTF gun. After installing a new cathode the number of rf pulses required to reach 120 MV/m is approximately 5-10 million. Total emitted dark current and Fowler Nordheim plots are also shown over the life of the cathode. The GTF photo-injector gun is an S-band standing-wave structure, with two resonant cavities and an intervening thick washer (Figure 1). The flat, back wall of the first cavity is a copper plate that serves as photocathode when illuminated with ultraviolet light from a pulsed, high-power laser. RF power enters the gun through an iris on the outer wall of the second cavity, and is coupled to the first through the axial opening of the washer. The first cavity is often referred to as a half cell, because its full-cell length has been truncated by the cathode plate and the second cavity is called the full cell. The gun is designed to operate in a {pi} mode, with the peak field on axis in each cell approximately equal. The maximum in the half cell occurs at the cathode, and in the full cell near the center of the cavity. The field profile and tuning procedures are discussed in a separate tech note [1].