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DOE OSTI2022

Single-beam ion source enhanced growth of transparent conductive thin films

A single-beam ion source was developed and used in combination with magnetron sputtering to modulate the film microstructure. The ion source emits a single beam of ions that interact with the deposited film and simultaneously enhances the magnetron discharge. The magnetron voltage can be adjusted over a wide range, from approximately 240 to 130 V, as the voltage of the ion source varies from 0 to 150 V, while the magnetron current increases accordingly. The low-voltage high-current magnetron discharge enables a 'soft sputtering mode', which is beneficial for thin-film growth. Indium tin oxide (ITO) thin films were deposited at room temperature using a combined single-beam ion source and magnetron sputtering. Furthermore, the ion beam resulted in the formation of polycrystalline ITO thin films with significantly reduced resistivity and surface roughness. Single-beam ion-source-enhanced magnetron sputtering has many potential applications in which low-temperature growth of thin films is required, such as coatings for organic solar cells.

36 MATERIALS SCIENCE↗

DOE OSTI2018

Optimization of sputtering NiOx films for perovskite solar cell applications

Highlights: • NiO{sub x} HTLs were fabricated by three kinds of magnetron sputtering techniques. • Chemical composition, lattice strain and energy levels of NiO{sub x} films were studied and compared. • PSCs based on sputtered NiO{sub x} HTL achieved highest PCE of 16.3% with negligible hysteresis. • Compared with PEDOT:PSS HTL, PSCs based on NiO{sub x} HTL exhibited enhanced stability in air. - Abstract: In this work, we systematically investigated the properties of three kinds of NiO{sub x} films prepared by magnetron sputtering either NiO or Ni target under direct current (DC) or radio frequency (RF) power without any preheating. Those NiO{sub x} films were found to be different in composition ratios, lattice strain and energy levels, thus showing different optical and carrier transport properties. By RF power source, sputtering Ni target in pure O{sub 2} atmosphere led to NiO{sub x} film with relatively good crystallization and surface properties compared with other two types of NiO{sub x} films. These NiO{sub x} films were further introduced into CH{sub 3}NH{sub 3}PbI{sub 3} based planar p-i-n heterojunction perovskite solar cells (PSCs) as the hole transport layers (HTL). It is revealed that PSCs based on NiO{sub x} HTL prepared by sputtering Ni target in pure O{sub 2} atmosphere achieved a highest power conversion efficiency of 16.3% with negligible hysteresis. Compared with devices with PEDOT:PSS HTL, PSCs based on magnetron sputtered NiO{sub x} HTL presented substantially improved stability in air. The results provide theoretical and experimental guidance on selecting NiO{sub x} HTLs fabricated by magnetron sputtering techniques.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗

DOE OSTI2016

Stability of Brillouin flow in the presence of slow-wave structure

Including a slow-wave structure (SWS) on the anode in the conventional, planar, and inverted magnetron, we systematically study the linear stability of Brillouin flow, which is the prevalent flow in crossed-field devices. The analytic treatment is fully relativistic and fully electromagnetic, and it incorporates the equilibrium density profile, flow profile, and electric field and magnetic field profiles in the linear stability analysis. Using parameters similar to the University of Michigan's recirculating planar magnetron, the numerical data show that the resonant interaction of the vacuum circuit mode and the corresponding smooth-bore diocotron-like mode is the dominant cause for instability. This resonant interaction is far more important than the intrinsic negative (positive) mass property of electrons in the inverted (conventional) magnetron geometry. It is absent in either the smooth-bore magnetron or under the electrostatic assumption, one or both of which was almost always adopted in prior analytical formulation. This resonant interaction severely restricts the wavenumber for instability to the narrow range in which the cold tube frequency of the SWS is within a few percent of the corresponding smooth bore diocotron-like mode in the Brillouin flow.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

DOE OSTI2022

Microstructural and nanomechanical studies of PVD Cr coatings on SiC for LWR fuel cladding applications

The microstructure and nanomechanical properties of pure Cr coatings deposited on SiC with various physical vapor deposition (PVD) methods have been investigated for the mitigation of hydrothermal corrosion of SiC-SiC f (SiC fiber-reinforced SiC matrix) composite fuel cladding in light water reactors (LWR). Cr coatings (4–7 μm thick) were deposited on unbiased SiC substrates using six variants of magnetron sputtering processes: (i) standard (S-DCMS), (ii) pulsed (P-DCMS), (iii) ion-assisted (I-DCMS), and (iv) pulsed ion-assisted direct current magnetron sputtering (PI-DCMS), (v) high-power impulse magnetron sputtering (HiPIMS), and (vi) bipolar HiPIMS (B-HiPIMS). Microstructural characterization and nanoindentation testing were used to evaluate effects of deposition technique on coating microstructure and nanomechanical properties. The application of positive reverse pulses to the sputter target induced coarsening of the columnar grain structure, while ion bombardment of substrates during deposition promoted densification of the coating microstructure. Both effects are exemplified in B-HiPIMS deposition, resulting in a high-density microstructure with compressive residual stress. Material pile-up around nano-indents and plastic work during nanoindentation were analyzed to understand deformation behavior of the coatings. Finally, the results suggest the B-HiPIMS process to be among the promising methods for the deposition of Cr coatings on SiC-SiC f for LWR cladding application.

36 MATERIALS SCIENCE↗

DOE OSTI2026

Co-sputter deposition of Nb₃Sn layer into SRF cavity using Nb-Sn composite target

Nb₃Sn, with its superior superconducting critical temperature (Tc ~18.3 K) and superheating field (Hsh ~400 mT), is considered a promising material for superconducting radiofrequency (SRF) cavities, offering enhanced cryogenic performance compared to bulk niobium cavities. A Nb₃Sn coating technique has been developed for Nb SRF cavities using co-sputtering of Nb-Sn composite target in a DC cylindrical magnetron sputtering system. The composite target configuration and discharge conditions for co-sputtering were optimized to deposit Nb-Sn films on flat Nb substrates, followed by annealing to form Nb₃Sn. Multiple strategies have been explored to improve the surface homogeneity of the Nb₃Sn coating, including optimizing a two-step annealing process, annealing in Sn vapor, and a light Sn recoating process. A 1.5 µm Nb-Sn co-sputtered film was deposited on the interior of a 2.6 GHz Nb SRF cavity and annealed at 600 °C for 6 h, followed by 950 °C for 1 h. Cryogenic RF testing of the annealed cavity demonstrated a Tc of 17.8 K, confirming the formation of Nb₃Sn. Then, the annealed cavity underwent a light recoating treatment and attained a quality factor (Q0) of 8.5E+08 at 2.0 K.

Accelerator Physics↗

DOE OSTI2019

Synthesis of metal chloride films: Influence of growth conditions on crystallinity

This paper presents the first deposition of metal chlorides by RF magnetron sputtering. By integrating the sputter chamber with an Ar-filled glovebox, films of hygroscopic chlorides can be synthesized and studied. The structure, composition, and morphology of FeCl 3 and FeCl 2 films were investigated as a function of deposition rate. In FeCl 3 films, the deposition rate has a large impact on the crystallinity of as-deposited films regardless of the substrate used. At high deposition rates, 24 Å/s, FeCl 3 films are crystalline with a preferred orientation along the 003-plane, while at low deposition rates, 0.5 Å/s, no crystalline peaks are observed for FeCl 3 . In FeCl 2 , the highest deposition rate achieved in this study was 0.2 Å/s which yields films with no crystalline peaks; therefore, Raman spectroscopy was used to confirm the presence of FeCl 2 . Here, the deposition of iron chlorides by RF magnetron sputtering opens the way for the study of thin film metal halides to understand their growth, magnetic and electronic properties, and understand ion transport through their layered structures.

36 MATERIALS SCIENCE↗

DOE OSTI2018

Surface Modification of C17200 Copper-Beryllium Alloy by Plasma Nitriding of Cu-Ti Gradient Film

In the present work, a copper-titanium film of gradient composition was firstly fabricated by the dual magnetron sputtering through power control and plasma nitriding of the film was then conducted to modify C17200 Cu alloy. The results showed that the prepared gradient Cu-Ti film by magnetron sputtering was amorphous. After plasma nitriding at 650 °C, crystalline Cu-Ti intermetallics appeared in the multi-phase coating, including CuTi{sub 2}, Cu{sub 3}Ti, Cu{sub 3}Ti{sub 2} and CuTi. Moreover, even though the plasma nitriding duration of the gradient Cu-Ti film was only 0.5 h, the mechanical properties of the modified Cu surface were obviously improved, with the surface hardness enhanced to be 417 HV{sub 0.01}, the wear rate to be 0.32 × 10{sup −14} m{sup 3}/Nm and the friction coefficient to be 0.075 at the load of 10 N, which are all more excellent than the C17200 Cu alloy. In addition, the wear mechanism also changed from adhesion wear for C17200 Cu substrate to abrasive wear for the modified surface.

36 MATERIALS SCIENCE↗

DOE OSTI2018

Cyclotron Phase-Coherent Ion Spatial Dispersion in a Non-Quadratic Trapping Potential is Responsible for FT-ICR MS at the Cyclotron Frequency

Fourier transform ion cyclotron resonance mass spectrometry (FT-ICR MS) at the cyclotron frequency instead of the reduced cyclotron frequency has been experimentally demonstrated using narrow aperture detection electrode (NADEL) ICR cells. Here, based on the results of SIMION simulations, we provide the initial mechanistic insights into the cyclotron frequency regime generation in FT-ICR MS. The reason for cyclotron frequency regime is found to be a new type of a collective motion of ions with a certain dispersion in the initial characteristics, such as pre-excitation ion velocities, in a highly non-quadratic trapping potential as realized in NADEL ICR cells. During ion detection, ions of the same m/z move in phase for cyclotron ion motion but out of phase for magnetron (drift) ion motion destroying signals at the fundamental and high order harmonics that comprise reduced cyclotron frequency components. After an initial magnetron motion period, ion clouds distribute into a novel type of structures – ion slabs, elliptical cylinders, or star-like structures. These structures rotate at the Larmor (half-cyclotron) frequency on a plane orthogonal to the magnetic field, inducing signals at the true cyclotron frequency on each of the narrow aperture detection electrodes. To eliminate the reduced cyclotron frequency peak upon dipolar ion detection, a number of slabs or elliptical cylinders organizing a star-like configuration are formed. In a NADEL ICR cell with quadrupolar ion detection, a single slab or an elliptical cylinder is sufficient to minimize the intensity of the reduced cyclotron frequency components, particularly the second harmonic. .

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗

DOE OSTI2018

Microstructural study and simulation of intrinsic two-way shape memory behavior of functionally graded Ni-rich/NiTiCu thin film

Highlights: • Ni-rich/Ti-rich bi-layer thin film was deposited on Si by using DC magnetron sputtering. • The bi-layer exhibits the gradient structure and mechanical properties through the thickness. • The bi-layer shows intrinsic two-way shape memory effect due to functionally graded structure. • The intrinsic two-way shape memory effect was confirmed by finite element simulation. - Abstract: In this research, the gradient structure and mechanical properties of an austenitic/martensitic (Ni{sub 50.8}Ti/Ni{sub 45}TiCu{sub 5} (at.%)) bi-layer thin film was investigated. The bi-layer was deposited on a Si substrate using DC magnetron sputtering. After crystallization of the film at 773 K for 60 min, the microstructure and mechanical properties of the bi-layer thin film were characterized using X-ray diffraction (XRD), transmission electron microscopy (STEM and HRTEM) and nanoindentation, respectively. The diffraction pattern illustrated that the crystallized bi-layer was combined of martensitic and austenitic layers while secondary ion mass spectroscopy (SIMS) and high resolution transmission electron microscopy analysis demonstrated the existence of a compositional gradient through the thickness and residual strain in the interface of the bi-layer, respectively. Furthermore, the compositional gradient in the bi-layer led to gradual variations in the structure, hardness and Young's modulus through the thickness of the bi-layer. The intrinsic two-way shape memory effect due to its functionally graded structure and the induced stress was confirmed by experimental test and finite element simulation.

36 MATERIALS SCIENCE↗

DOE OSTI2018

Improving performance of the MgZnO ultraviolet photodetectors by changing the interdigital electrode width

Highlights: • The different electrode width of the metal-semiconductor-metal photodetectors are fabricated by the radio frequency magnetron sputtering technique. • The responsivity and the dark current of the photodetectors will vary with the electrode width. • The main reason of the interesting phenomenon is the change of the density of the carriers. - Abstract: We grow the Mg{sub 0.24}Zn{sub 0.76}O thin film onto a quartz substrate by the radio frequency magnetron sputtering technique. Planar geometry metal-semiconductor-metal structured ultraviolet detectors were fabricated by conventional ultraviolet lithography and wet etching on the Mg{sub 0.24}Zn{sub 0.76}O thin films. To improve the performance of the device, three kinds of photodetectors with different electrode width were fabricated, after a series of tests on those device, it is amusing to find an interesting phenomenon, the Mg{sub 0.24}Zn{sub 0.76}O photodetectors with different electrode width have a great influence on the performance of the whole device. The Mg{sub 0.24}Zn{sub 0.76}O photodetectors that own larger electrode width had a higher responsivity and lower dark current than the photodetectors own littler electrode width. These interesting results are very meaningful for the photodetector industry.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗

DOE OSTI2018

Influence of the substrate temperature on the microstructure and electron-induced secondary electron emission properties of MgO/Au composite film

Highlights: • MgO/Au film was prepared by magnetron sputtering of individual Mg and Au targets. • A higher substrate temperature (T{sub s}) is conducive to the growth of MgO grains. • The surface roughness firstly rises and then decreases with T{sub s} increasing. • The increase of T{sub s} greatly enhances the SEE coefficient of the composite film. - Abstract: The influence of the substrate temperature (T{sub s}) on the microstructure and electron-induced secondary electron emission (SEE) properties of MgO/Au composite film prepared by reactive magnetron sputtering was investigated in order to improve the SEE performance of this composite film. During the deposition of MgO/Au film, a relatively high T{sub s} is conducive to the growth of MgO grains and causes the formation of some large aggregated gold particles on which MgO grains cover in the composite film. In terms of the SEE properties of MgO/Au film, the increase of T{sub s} brings about a significant improvement of SEE coefficient (δ), while it also leads to a slightly accelerated SEE degradation under the continuous electron bombardment due to a faster surface charging. The MgO/Au film prepared at T{sub s} of 773 K has a δ value of 4.9 at a primary electron energy of 200 eV and the maximum δ value of 11.5.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗

DOE OSTI2025

High efficiency RF sources developments

Calabazas Creek Research, Inc. (CCR) and its collaborators are developing high efficiency RF sources operating from a few hundred MHz to C-Band and power levels from tens to hundreds of kilowatts with the goal of providing MW-relevant sources. The efficiencies approach or exceed 80% with projected costs as low as $0.50/ Watt. Sources under development include magnetrons with phase and amplitude control, single and multi-beam klystrons, multi-beam power grid tubes, and multiple beam IOTs. A magnetron system achieved more than 80% efficiency with fast amplitude control using modulation of the phase locking signal. This would be a low cost, high efficiency RF source for superconducting accelerators. An L-Band, single beam klystron was built with simulated efficiency of 80%. The klystron has yet to be tested to confirm the simulation results. CCR is currently developing a multi-beam klystron to produce more than 200 kW CW at 80% efficiency. Also in development is a multiple beam triode to produce 200 kW CW from 300 MHz to approximately 1 GHz. Not only does the simulated efficiency exceed 75%, but it would be the lowest cost RF source in this frequency range. Finally, CCR recently concluded research for a multiple beam IOT at 700 MHz using third harmonic drive to boost efficiency toward 85%. Successful development and transition to production of these sources will significantly alter the cost/performance landscape for RF power generation.

43 PARTICLE ACCELERATORS↗

DOE OSTI2024

Sputter-Coated TiO 2 Films as Passivation and Hole Transfer Layers for Improved Energy Conversion with Solar Fuel WO 3 /CuWO 4 Photoanodes

Atomic layer deposited (ALD) “leaky” TiO 2 have gained interest as charge-selective protection layers for semiconductor solar fuel electrodes. Here we demonstrate the use of sputter-deposited TiO 2 layers as hole selective contacts for WO 3 /CuWO 4 type 2 heterojunction water oxidation photoanodes for the first time. TiO 2 protection layers with varying thicknesses (2 to 128 nm) were deposited using the RF magnetron sputtering technique. The resulting TiO 2 films are amorphous based on Raman spectroscopy and powder XRD. Photoelectrochemical scans and Vibrating Kelvin probe photovoltage spectroscopy show that 2-8 nm TiO 2 layers nearly double the photocurrent to 0.97 mA cm -2 under AM 1.5 illumination (19% AQE at 350 nm), increase the surface photovoltage signal by 25%, and increase the WO 3 /CuWO 4 bandgap. These effects can be attributed to the selectivity of TiO 2 for photoholes. Additionally, SPV data suggest that TiO 2 overlayers suppress copper-based surface recombination defects. Reduced photocurrent and the photovoltage are seen in thicker TiO 2 films (16 to 128 nm) as a result of an increasing hole transfer resistance and because of light shading effects according to photoaction spectra. The TiO 2 films also improve the stability of the WO 3 /CuWO 4 photoelectrodes, allowing nearly constant O 2 evolution over 3 hours after an initial 20-35% loss. Overall, this work establishes RF magnetron sputtering as a useful method to install amorphous TiO 2 passivation layers for improved WO 3 /CuWO 4 solar fuel photoelectrodes. Furthermore, we show how the combination of PEC with SPV measurements provides insight into the function of the TiO 2 coatings.

CuWO4↗

DOE OSTI2016

Fabrication of electrocatalytic Ta nanoparticles by reactive sputtering and ion soft landing

About 40 years ago, it was shown that tungsten carbide exhibits similar catalytic behavior to Pt for certain commercially relevant reactions, thereby suggesting the possibility of cheaper and earth-abundant substitutes for costly and rare precious metal catalysts. In this work, reactive magnetron sputtering of Ta in the presence of three model hydrocarbons (2-butanol, heptane, and m-xylene) combined with gas aggregation and ion soft landing was employed to prepare organic-inorganic hybrid nanoparticles (NPs) on surfaces for evaluation of catalytic activity and durability. The electro-catalytic behavior of the NPs supported on glassy carbon was evaluated in acidic aqueous solution by cyclic voltammetry. The Ta-heptane and Ta-xylene NPs were revealed to be active and robust toward promotion of the oxygen reduction reaction, an important process occurring at the cathode in fuel cells. In comparison, pure Ta and Ta-butanol NPs were essentially unreactive. Characterization techniques including atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and transmission electron microscopy (TEM) were applied to probe how different sputtering conditions such as the flow rates of gases, sputtering current, and aggregation length affect the properties of the NPs. AFM images reveal the focused size of the NPs as well as their preferential binding along the step edges of graphite surfaces. In comparison, TEM images of the same NPs on carbon grids show that they bind randomly to the surface with some agglomeration but little coalescence. The TEM images also reveal morphologies with crystalline cores surrounded by amorphous regions for NPs formed in the presence of 2-butanol and heptane. In contrast, NPs formed in the presence of m-xylene are amorphous throughout. XPS spectra indicate that while the percentage of Ta, C, and O in the NPs varies depending on the sputtering conditions and hydrocarbon employed, the electron binding energies of the elements are similar for all of the NPs. Here, the difference in reactivity between the NPs is attributed to their Ta/C ratios. Collectively, the findings presented herein indicate that reactive magnetron sputtering and gas aggregation combined with ion soft landing offer a promising physical approach for the synthesis of organic-inorganic hybrid NPs that have potential as low-cost durable substitutes for precious metals in catalysis

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

DOE OSTI2020

Metal-ion-controlled growth and nanoindentation response of 3D, bicontinuous Cu–Fe thin films

Bicontinuous, nanocomposite thin film morphologies depend largely on the deposition conditions applied during physical vapor deposition. With the introduction of high power impulse magnetron sputtering (HiPIMS), the range of potential morphologies achieved during deposition has been increased. In this work, we compare the deposition outcomes between traditional direct-current magnetron sputtering (DCMS) and HiPIMS for a thin film co deposit of Cu and Fe. Modular control of the columnarity, porosity and roughness was achieved by varying the Cu and Fe metal ion currents during deposition. The directionality of the nanostructured phase-separated morphology was also controlled as the ion current increased. At zero ion current for both Cu and Fe sputtered species during DCMS, the film exhibited lateral concentration modulations of Cu and Fe. The directionality of the Cu- and Fe-rich phases shifted to vertical concentration modulations at low ion currents of I Fe = 1A and I Cu = 0:1A and to lateral concentration modulations at relatively moderate ion currents of I Fe = 5A and I Cu = 2A: At high ion currents of I Fe = 18A and I Cu = 2A; a more randomized phase domain structure was observed on the nanoscale. This structural shift is rationalized using an interdiffusion model. Here, the role of different kinds of phase separated morphologies, achieved during DCMS deposition, on the mechanical properties has also been studied. Results indicated increase in hardness, indentation modulus and flow strength values with the increase in indentation strain rates. Bicontinuous Cu-Fe nanocomposites are found to be stronger than multilayer Cu-Fe samples.

36 MATERIALS SCIENCE↗

DOE OSTI2018

Structure of Diamond-Like Silicon–Carbon Films Alloyed by Vanadium

The structure of diamond-like silicon–carbon films formed on silicon substrates by magnetron and plasmatron codeposition using a closed-field magnetron and a plasmatron activated by tungsten cathode has been studied by transmission electron microscopy. The main feature of the films alloyed by vanadium to concentrations of 12–31 at % was found to be a layered structure of the film cross section. It was established that vanadium alloying leads to the formation of vanadium carbide (VC) nanocrystals; the nanocrystal size increases from 1–2 to 10 nm. At the maximum vanadium content, VC nanocrystals have an anisotropic shape: they are extended in the direction perpendicular to the film–substrate interface.

36 MATERIALS SCIENCE↗

DOE OSTI2018

Electrical Conductivity and Barrier Properties of Lithium Niobate Thin Films

The thin-film structures made of LiNbO{sub 3} and obtained via laser ablation and magnetron sputtering are studied with volt-farad and volt-ampere characteristics. A potential barrier on the Si–LiNbO{sub 3} interface was found for both types of the films with the capacitance-voltage characteristics. The current-voltage characteristics showed that there are several conduction mechanisms in the structures studied. The Poole–Frenkel effect and the currents limited by a space charge mainly contribute to the electrical conductivity in the LiNbO{sub 3} film produced with the laser ablation method. The currents limited by a space charge contribute to the main mechanism in the film heterostructure obtained with the magnetron sputtering method.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗

DOE OSTI2018

Structural and Magnetic Characteristics of Nanogranular Co–Al{sub 2}O{sub 3} Single- and Multilayer Films Formed by the Solid-State Synthesis

The results of structural and magnetic investigations of nanogranular Co–Al{sub 2}O{sub 3} films formed from Co{sub 3}O{sub 4}/Al thin-film layered structures upon vacuum annealing are reported. The Co{sub 3}O{sub 4}/Al films have been obtained by sequential reactive magnetron sputtering of a metallic cobalt target in a medium consisting of the Ar + O{sub 2} gas mixture and magnetron sputtering of an aluminum target in the pure argon atmosphere. It is shown that such a technique makes it possible to obtain nanogranular Co–Al{sub 2}O{sub 3} single- and multilayer thin films with a well-controlled size of magnetic grains and their distribution over the film thickness.

77 NANOSCIENCE AND NANOTECHNOLOGY↗