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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 217 records · Page 12
All sourcesNASA NTRSDOE OSTI
NASA NTRS1988

Preparation of dilute magnetic semiconductor films by metalorganic chemical vapor deposition

A method for preparation of a dilute magnetic semiconductor (DMS) film is provided, in which a Group II metal source, a Group VI metal source and a transition metal magnetic ion source are pyrolyzed in the reactor of a metalorganic chemical vapor deposition (MOCVD) system by contact with a heated substrate. As an example, the preparation of films of Cd(sub 1-x)Mn(sub x)Te, in which 0 is less than or equal to x less than or equal to 0.7, on suitable substrates (e.g., GaAs) is described. As a source of manganese, tricarbonyl (methylcyclopentadienyl) manganese (TCPMn) is employed. To prevent TCPMn condensation during its introduction into the reactor, the gas lines, valves and reactor tubes are heated. A thin-film solar cell of n-i-p structure, in which the i-type layer comprises a DMS, is also described; the i-type layer is suitably prepared by MOCVD.

Nouhi, Akbar↗
NASA NTRS1972

Fabrication and evaluation of chemically vapor deposited tungsten heat pipe.

A network of lithium-filled tungsten heat pipes is being considered as a method of heat extraction from high temperature nuclear reactors. The need for material purity and shape versatility in these applications dictates the use of chemically vapor deposited (CVD) tungsten. Adaptability of CVD tungsten to complex heat pipe designs is shown. Deposition and welding techniques are described. Operation of two lithium-filled CVD tungsten heat pipes above 1800 K is discussed.

Bacigalupi, R. J.↗
NASA NTRS1985

Experimental and Theoretical Analysis of Chemical Vapor Deposition with Prediction of Gravity Effects

A combined experimental and theoretical study to characterize the effects of gravitationally-induced transport on atmospheric pressure silicon epitaxy by SiH4 pyrolysis is planned. Experimentally, flow regimes in which free convective transport contributes to the Chemical Vapor Deposition (CVD) process will be identified, and, for these conditions, the flow and deposition process will be characterized. Specifically, this will include measurements of three dimensional temperature variations using in situ Rayleigh scattering, gas phase composition profiles using laser absorption and fluorescence techniques, and deposition rates and defect densities. Subsequently, the free convective transport contribution to the CVD process will be minimized and/or altered while leaving deposition chemistry unaltered, and the characterization will be repeated. Based on these analyses, the effects of gravitationally-induced transport on atmospheric pressure CVD will be assessed.

Charter D. Stinespring↗
NASA NTRS2000

Friction and Wear Properties of Selected Solid Lubricating Films: Magnetron-Sputtered and Plasma-Assisted, Chemical-Vapor-Deposited Diamondlike Carbon Films - Part 3

To evaluate commercially developed dry solid film lubricants for aerospace bearing applications, an investigation was conducted to examine the friction and wear behavior of magnetron-sputtered diamondlike carbon (MS DLC) and plasma-assisted, chemical-vapor-deposited diamondlike carbon (PACVD DLC) films in sliding contact with 6-mm-diameter American Iron and Steel Institute (AISI) 440C stainless steel balls. Unidirectional sliding friction experiments were conducted with a load of 5.9 N (600 g), a mean Hertzian contact pressure of 0.79 GPa (maximum Hertzian contact pressure of L-2 GPa), and a sliding velocity of 0.2 m/s. The experiments were conducted at room temperature in three environments: ultrahigh vacuum (vacuum pressure, 7x10(exp -7) Pa), humid air (relative humidity, approx.20 percent), and dry nitrogen (relative humidity, <1 percent). The resultant films were characterized by scanning electron microscopy, energy-dispersive x-ray spectroscopy, and surface profilometry. Marked differences in the friction and wear of the DLC films investigated herein resulted from the environmental conditions. The main criteria for judging the performance of the DLC films were coefficient of friction and wear rate, which had to be less than 0.3 and on the order of 10(exp -6) cu mm/N-m or less, respectively. MS DLC films and PACVD DLC films met the criteria in humid air and dry nitrogen but failed in ultrahigh vacuum, where the coefficients of friction were greater than the criterion, 0.3. In sliding contact with 440C stainless steel balls in all three environments the PACVD DLC films exhibited better tribological performance (i.e., lower friction and wear) than the MS DLC films. All sliding involved adhesive transfer of wear materials: transfer of DLC wear debris to the counterpart 440C stainless steel and transfer of 440C stainless steel wear debris to the counterpart DLC film.

Miyoshi, Kazuhisa↗
NASA NTRSDate not supplied

Kinetic Model Development of the Carbon Vapor Deposition Reactor to Predict Performance Versus Design

To enable complete closure of a Sabatier-based atmosphere revitalization system where oxygen recovery is predicated by carbon dioxide reduction to methane and water, there must be a means of recovering the hydrogen from the byproduct methane. Honeywell’s carbon vapor deposition (CVD) reactor is a potential technology that provides a thermochemical means by which methane decomposes at high temperatures (> 1,000 °C) into hydrogen, solid carbon, and a small percentage of hydrocarbons. This advanced methane pyrolysis reactor utilizes a carbon fiber substrate to capture and immobilize the solid pyrolytic carbon rather than allowing continuation toward undesirable soot. The CVD reactor is a highly dynamic system whose characteristic geometry changes while operating. The reactor model was developed to provide predictive performance assessment capabilities at different operating conditions, geometries, and configurations to aid in technology development. Modeling of the CVD reactor considered the multitude of simultaneous and interdependent physicochemical processes that are entailed, including: (1) the homogeneous gas-phase pyrolysis reactions, (2) the heterogeneous deposition reactions, and (3) the transport of gaseous species in the reactor domains. A 1-D CVD reactor model was developed based on a general packed-bed, axial-dispersion plug flow reactor model with a solid substrate balance to account for carbon deposition. The model includes 59 species and 243 reactions constituting the methane pyrolysis reaction network, carbon deposition, and interconversions of oxygenate species. The reactor model was compared to brassboard test data, where it was shown to be able to capture the pertinent physicochemical phenomena as evidenced by its agreement with short-duration run data (i.e., looking at different temperature and flow rate conditions), as well as trend agreement with the brassboard reactor’s long-duration test data. Recommendations are provided on further model development steps as well as its use cases.

Air Revitalization↗
NASA NTRS2003

Corrosion of Highly Specular Vapor Deposited Aluminum (VDA) on Earthshade Door Sandwich Structure

High-resolution infrared (IR) imaging requires spacecraft instrument design that is tightly coupled with overall thermal control design. The JPL Tropospheric Emission Spectrometer (TES) instrument measures the 3-dimensional distribution of ozone and its precursors in the lower atmosphere on a global scale. The TES earthshade must protect the 180-K radiator and the 230-K radiator from the Earth IR and albedo. Requirements for specularity, emissivity, and solar absorptance of inner surfaces could only be met with vapor deposited aluminum (VDA). Circumstances leading to corrosion of the VDA are described. Innovative materials and processing to meet the optical and thermal cycle requirements were developed. Examples of scanning electronmicroscope (SEM), atomic force microscope (AFM), and other surface analysis techniques used in failure analysis, problem solving, and process development are given. Materials and process selection criteria and development test results are presented in a decision matrix. Examples of conditions promoting and preventing galvanic corrosion between VDA and graphite fiber-reinforced laminates are provided.

Plaskon, Daniel↗
NASA NTRS1994

Neutral Ion Figuring of Chemical Vapor Deposited SiC

Ion figuring of optical components is a relatively new technology that can alleviate some of the problems associated with traditional contact polishing. Because the technique is noncontacting, edge distortions and rib structure print through do not occur. This investigation was aimed at determining the effect of ion figuring on surface roughness of previously polished or ductile ground ceramic optical samples. This is the first step in research directed toward the combination of a prefinishing process (ductile grinding or polishing) with ion figuring to produce finished ceramic mirrors. Multiple, chemical vapor deposited silicon carbide (CVD SiC) samples were polished or ductile ground to specular or near-specular roughness. These samples were then characterized to determine topographic surface information. The surface evaluation consisted of stylus profilometry, interferometry, and optical and scanning electron microscopy. The surfaces were then ion machined to depths from 0 to 5 micron. The finished surfaces were characterized to evaluate the effects of the ion-machining process with respect to the previous processing methods and the preexisting subsurface damage. This study provides some of the information required to effectively utilize a combined ductile grinding or polishing with ion machining as a procedure for figuring optical components.

Fawcett, Steven C.↗
NASA NTRS1995

Chemical Vapor-Deposited (CVD) Diamond Films for Electronic Applications

Diamond films have a variety of useful applications as electron emitters in devices such as magnetrons, electron multipliers, displays, and sensors. Secondary electron emission is the effect in which electrons are emitted from the near surface of a material because of energetic incident electrons. The total secondary yield coefficient, which is the ratio of the number of secondary electrons to the number of incident electrons, generally ranges from 2 to 4 for most materials used in such applications. It was discovered recently at the NASA Lewis Research Center that chemical vapor-deposited (CVD) diamond films have very high secondary electron yields, particularly when they are coated with thin layers of CsI. For CsI-coated diamond films, the total secondary yield coefficient can exceed 60. In addition, diamond films exhibit field emission at fields orders of magnitude lower than for existing state-of-the-art emitters. Present state-of-the-art microfabricated field emitters generally require applied fields above 5x10^7 V/cm. Research on field emission from CVD diamond and high-pressure, high-temperature diamond has shown that field emission can be obtained at fields as low as 2x10^4 V/cm. It has also been shown that thin layers of metals, such as gold, and of alkali halides, such as CsI, can significantly increase field emission and stability. Emitters with nanometer-scale lithography will be able to obtain high-current densities with voltages on the order of only 10 to 15 V.

Source record↗
NASA NTRS1979

The structure of small, vapor-deposited particles. II - Experimental study of particles with hexagonal profile

'Multiply-twinned' gold particles with hexagonal bright field TEM profile were determined to be icosahedra composed of 20 identical and twin-related tetrahedral building units that do not have an fcc structure. The crystal structure of these slightly deformed tetrahedra is rhombohedral. Experimental evidence supporting this particle model was obtained by selected-zone dark field and weak beam dark field electron microscopy. In conjunction with the results of part I, it has been concluded that multiply-twinned gold particles of pentagonal or hexagonal profile that are found during the early stages of the vapor deposition growth process on alkali halide surfaces do not have an fcc crystal structure, which is in obvious contrast to the structure of bulk gold.

Yacaman, M. J.↗
NASA NTRS1999

Structure and Morphology of Phthalocyanine Films Grown in Electrical Fields by Vapor Deposition

Phthalocyanine is a very stable organic material in the atmosphere and has been used in numerous applications, such as optical switching and optical storage devices. Although this material has already been discovered for several decades and has had extensive studies conducted on it, many properties still need to be better understood, for example, the mechanisms of forming different solid phases and of changing film morphology by external forces. Phthalocyanine has two preferred solid phases (alpha and beta phases) for which the crystal structures, surface morphology and optical properties are different. In order to investigate these phenomena and the relationship among them, phthalocyanine films have been synthesized by vapor deposition on quartz substrates with and without an external electrical field. Some substrates were coated with a very thin gold film for the electrical field. These films have been characterized using x-ray diffraction, scanning electron microscopy, Fourier transfer infrared spectroscopy, and Z-scan technique. The films have excellent chemical and thermal stability. However, the surface of these films grown without the electrical field shows flower-like morphology. When films are deposited under an electrical field (approximately 3000 V/cm), an aligned structure is revealed on the surface. A comparison of the structure, morphology, optical properties, and the growth mechanism for these films with and without an electrical field will be discussed.

Zhu, Shen↗
NASA NTRS2004

Conversion Coatings for Aluminum Alloys by Chemical Vapor Deposition Mechanisms

With the rise of environmental awareness and the renewed importance of environmentally friendly processes, the United States Environmental Protection Agency has targeted surface pre-treatment processes based on chromates. Indeed, this process has been subject to regulations under the Clean Water Act as well as other environmental initiatives, and there is today a marked movement to phase the process out in the near future. Therefore, there is a clear need for new advances in coating technology that could provide practical options for replacing present industrial practices. Depending on the final application, such coatings might be required to be resistant to corrosion, act as chemically resistant coatings, or both. This research examined a chemical vapor deposition (CVD) mechanism to deposit uniform conversion coatings onto aluminum alloy substrates. Robust protocols based on solutions of aryl phosphate ester and multi-oxide conversion coating (submicron) films were successfully grown onto the aluminum alloy samples. These films were characterized by X-ray Photoelectron Spectroscopy (XPS). Preliminary results indicate the potential of this technology to replace aqueous-based chromate processes.

Reye, John T.↗
NASA NTRS2004

Modeling of Sheath Ion-Molecule Reactions in Plasma Enhanced Chemical Vapor Deposition of Carbon Nanotubes

In many plasma simulations, ion-molecule reactions are modeled using ion energy independent reaction rate coefficients that are taken from low temperature selected-ion flow tube experiments. Only exothermic or nearly thermoneutral reactions are considered. This is appropriate for plasma applications such as high-density plasma sources in which sheaths are collisionless and ion temperatures 111 the bulk p!asma do not deviate significantly from the gas temperature. However, for applications at high pressure and large sheath voltages, this assumption does not hold as the sheaths are collisional and ions gain significant energy in the sheaths from Joule heating. Ion temperatures and thus reaction rates vary significantly across the discharge, and endothermic reactions become important in the sheaths. One such application is plasma enhanced chemical vapor deposition of carbon nanotubes in which dc discharges are struck at pressures between 1-20 Torr with applied voltages in the range of 500-700 V. The present work investigates The importance of the inclusion of ion energy dependent ion-molecule reaction rates and the role of collision induced dissociation in generating radicals from the feedstock used in carbon nanotube growth.

Hash, David B.↗
NASA NTRS2002

The Surface Interface Characteristics of Vertically Aligned Carbon Nanotube and Graphitic Carbon Fiber Arrays Grown by Thermal and Plasma Enhanced Chemical Vapor Deposition

The development of nano-arrays for sensors and devices requires the growth of arrays with the proper characteristics. One such application is the growth of vertically aligned carbon nanotubes (CNTs) and graphitic carbon fibers (GCFs) for the chemical attachment of probe molecules. The effectiveness of such an array is dependent not only upon the effectiveness of the probe and the interface between that probe and the array, but also the array and the underlaying substrate. If that array is a growth of vertically aligned CNTs or GCFs then the attachment of that array to the surface is of the utmost importance. This attachment provides the mechanical stability and durability of the array, as well as, the electrical properties of that array. If the detection is to be acquired through an electrical measurement, then the appropriate resistance between the array and the surface need to be fabricated into the device. I will present data on CNTs and GCFs grown from both thermal and plasma enhanced chemical vapor deposition. The focus will be on the characteristics of the metal film from which the CNTs and GCFs are grown and the changes that occur due to changes within the growth process.

Delzeit, Lance↗
NASA NTRS2021

Solid Particle Erosion of a Plasma Spray – Physical Vapor Deposition Environmental Barrier Coating in a Combustion Environment

Environmental barrier coatings (EBCs) were developed to reduce the susceptibility of SiC-based composites to the rapid volatilization and surface recession that occurs in the presence of water vapor. Extensive research and development has been performed on EBCs, and their corresponding failure mechanisms under different environmental conditions. However, one key failure mechanism, solid particle erosion (SPE), has not been thoroughly investigated. As a result, the present work investigates the SPE behavior of a ytterbium disilicate (Yb2Si2O7) environmental barrier coating (EBC) deposited via plasma spray-physical vapor deposition (PS-PVD). Erosion testing was performed at elevated temperature (1,200 °C) in a simulated combustion environment at the NASA Glenn Research Center Erosion Burner Rig Facility. Alumina (Al2O3) particles were used as the eroding media. A range of particle kinetic energies and impingement angles were investigated along with the effect of coating surface roughness. The post-erosion damage morphology was characterized using scanning electron microscopy (SEM). The SPE behavior of the PS-PVD EBC was shown to be comparable to other EBC systems reported in the literature.

Solid particle erosion; environmental barrier coat↗
NASA NTRS1967

Welding, bonding, and sealing of refractory metals by vapor deposition

Plating process welds, bonds, and seals refractory metals without weakening or changing the structure of the base metals. A metal halide compound in the vapor phase is decomposed to deposit filler metal on the base metal. The resulting bond is a true metal-to-metal bond.

Source record↗
NASA NTRS1984

Experimental verification of vapor deposition model in Mach 0.3 burner rigs

A comprehensive theoretical framework of deposition from combustion gases was developed covering the spectrum of various mass delivery mechanisms including vapor, thermophoretically enhanced small particle, and inertially impacting large particle deposition. Rational yet simple correlations were provided to facilitate engineering surface arrival rate predictions. Experimental verification of the deposition theory was validated using burner rigs. Toward this end, a Mach 0.3 burner rig apparatus was designed to measure deposition rates from salt-seeded combustion gases on an internally cooled cylindrical collector.

Gokoglu, S. A.↗