Search NASA⌕ Search

SEARCH · Search NASA

Results for “Sputtering”

Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

Quote a phrase for an exact phrase match. Source license links do not imply unrestricted reuse.

At least 235 records · Page 13
All sourcesNASA NTRSDOE OSTI
NASA NTRS1987

Sputtered cadmium oxide as a surface pretreatment for graphite solid-lubricant films

Sputtered films of cadmium oxide were applied to sand blasted AISI 440C HT stainless steel disks as a surface pretreatment for the application of rubbed graphite films. Mixtures of cadmium oxide and graphite were applied to the nonpretreated sandblasted metal and evaluated. The results were compared to graphite films applied to other commercially available surface pretreatments. It is found that sputtered CdO pretreated surfaces increase the endurance lives of the graphite films and decrease the counterface steady state wear rate of the pins almost an order of magnitude compared to commercially available pretreatments. The CdO additions in general improved the tribological properties of graphite. The greatest benefit occurred when it was applied to the substrate rather than mixing it with the graphite and that sputtered films of CdO perform much better than rubbed CdO films.

Fusaro, Robert L.↗
NASA NTRS1989

Application of laboratory data to the sputtering of a planetary regolith

The effective yield from a planetary regolith composed of approximately spherical grains is characterized in light of expressions for laboratory sputtering data. In the case of a fully-exposed regolith, the effective yield is of the order of 0.4-1 times the measured yield at normal incidence; the range of variation for this value depends on the nature of the sputtering process employed. These results are applicable to such problems as the magnetospheric plasma sputtering of the outer solar system's icy satellites.

Johnson, R. E.↗
NASA NTRS1988

Hybrid solar cells based on dc magnetron sputtered films of n-ITO on APMOVPE grown p-InP

Hybrid indium-tin-oxide (ITO)/InP solar cells are discussed. The cells are constructed by dc magnetron sputter deposition of ITO onto high-quality InP films grown by atmospheric pressure metal-organic vapor-phase epitaxy (APMOVPE). A record efficiency of 18.9 percent, measured under standard Solar Energy Research Institute reporting conditions, has been obtained. The p-InP surface is shown to be type converted, principally by the ITO, but with the extent of conversion being modified by the nature of the sputtering gas. The deposition process, in itself, is not responsible for the type conversion. Dark currents have been suppressed by more than three orders of magnitude by the addition of hydrogen to the sputtering gas during deposition of a thin (5 nm) interface layer. Without this layer, and using only the more usual argon/oxygen mixture, the devices had poorer efficiencies and were unstable. A discussion of associated quantum efficiencies and capacitance/voltage measurements is also presented from which it is concluded that further improvements in efficiency will result from better control over the type-conversion process.

Coutts, T. J.↗
NASA NTRS1990

Investigation of buried homojunctions in p-InP formed during sputter deposition of both indium tin oxide and indium oxide

While dc magnetron sputter deposition of indium tin oxide leads to the formation of a buried homojunction in single crystal p-type InP, the mechanism of type conversion of the InP surface is not apparent. In view of the recent achievement of nearly 17-percent global efficiencies for cells fabricated solely by sputter deposition of In2O3, it is presently surmised that tin may not be an essential element in type conversion. A variety of electrical and optical techniques are presently used to evaluate the changes at both indium tin oxide/InP and indium oxide/InP interfaces. Such mechanisms as the passivation of acceptors by hydrogen, and sputter damage, are found to occur simultaneously.

Gessert, T. A.↗
NASA NTRS1990

Ion beam sputtering of in situ superconducting Y-Ba-Cu-O films

Oriented superconducting YBa2Cu3O7 thin films were deposited on yttria stabilized zirconia and SrTiO3 substrates by ion-beam sputtering of a nonstoichiometric oxide target. The films exhibited zero-resistance critical temperatures as high as 83.5 K without post-deposition anneals. Both the deposition rate and the c-lattice parameter data displayed two distinct regimes of dependence on the beam power of the ion source. Low-power sputtering yielded films with large c-dimensions and low Tc. Higher-power sputtering produced a continuous decrease in the c-lattice parameter and increase in critical temperature. Films having the smaller c-lattice parameters were Cu rich. The Cu content of films deposited at beam voltages of 800 V and above increased with increasing beam power.

Klein, J. D.↗
NASA NTRS1991

Ion beam sputtering in electric propulsion facilities

Experiments were undertaken to determine sputter yields of potential ion beam target materials, to assess the impact of charge exchange on beam diagnostics in large facilities, and to examine material erosion and deposition after a 957 hr test of a 5 kW-class ion thruster. The xenon ion sputter yield of flexible graphite was lower than other graphite forms especially at high angles of incidence. Ion beam charge exchange effects were found to hamper beam probe current collection diagnostics even at pressures from 0.7 to 1.7 mPa. Estimates of the xenon ion beam envelope were made and predictions of the thickness of sputter deposited coatings in the facility were compared with measurements.

Sovey, James S.↗
NASA NTRS1991

Lubrication with sputtered MoS2 films: Principles, operation, limitations

The present practices, limitations, and understanding of thin sputtered MoS2 films are reviewed. Sputtered MoS2 films can exhibit remarkable tribological properties such as ultralow friction coefficients (0.01) and enhanced wear lives (millions of cycles) when used in vacuum or dry air. To achieve these favorable tribological characteristics, the sputtering conditions during deposition must be optimized for adequate film adherence and appropriate structure (morphology) and composition.

Spalvins, T.↗
NASA NTRS1990

Buried homojunction solar cells formed in p-InP during sputter deposition and hydrogen plasma processing

Although it is apparent that direct current (DC) magnetron sputter deposition of indium tin oxide (ITO) leads to the formation of a buried homojunction in single-crystal p-type InP, the actual mechanism of type conversion of the InP surface is not clear. Since sputter deposition of In2O3 has also led to high-quality cells, it appears that Sn is not the cause of type conversion. To investigate the junction formation process further, experiments involving the use of a pure hydrogen plasma have been performed, resulting in type conversion of Fe-doped InP surfaces and in solar cells with efficiencies over 16 percent (global). The results confirm that sputter deposition is not necessary to form this type of buried homojunction solar cell, and they suggest a fabrication process that may be used with other relevant photovoltaic materials.

Gessert, T. A.↗
NASA NTRS1991

A reevaluation of the solar-wind sputtering rate on the lunar surface

Knowledge of the retention efficiency for solar-wind-implanted Ar-36 in lunar surface material and measurement of the Ar-36 concentration in a sputtered surface make it possible to calculate an upper limit to the effective sputtering rate at which that surface has been eroded. On the basis of data for 71501 plagioclase and the glass of rock 12054, a value is derived for the sputter-erosion rate equal to less than 0.0024 + or - 0.001 A/yr, in good agreement with the limit of less than 0.0035 A/yr previously calculated by Zinner et al. (1977).

Kerridge, J. F.↗
NASA NTRS1991

Ion beam sputtering in electric propulsion facilities

Experiments were undertaken to determine sputter yields of potential ion beam target materials, to assess the impact of charge exchange on beam diagnostics in large facilities, and to examine material erosion and deposition after a 957-hour test of a 5 kW-class ion thruster. The xenon ion sputter yield of flexible graphite was lower than other graphite forms especialy at high angles of incidence. Ion beam charge exchange effects were found to hamper beam probe current collection diagnostics even at pressures from 0.7 to 1.7 mPa. Estimates of the xenon ion beam envelope were made and predictions of the thickness of sputter deposited coatings in the facility were compared with measurements.

Sovey, James S.↗
NASA NTRS1992

Ambient-Temperature Sputtering Of Composite Oxide Films

Technique for deposition of homogeneous films of multicomponent oxides on substrates at ambient temperature based on sequential sputter deposition of individual metal components, as alternating ultra-thin layers, from multiple targets. Substrates rotated over sputtering targets of lead, zirconium, and titanium. Dc-magnetron sputtering of constituent metals in reactive ambient of argon and oxygen leads to formation of the respective metal oxides intermixed on extremely fine scale in desired composition. Compatible with low-temperature microelectronic processing.

Thakoor, Sarita↗
NASA NTRS1991

Lunar surface - Sputtering and secondary ion mass spectrometry

Laboratory and Apollo observations are combined to describe the sputtering of the lunar surface and the composition of the ejecta with special reference to O. The atmospheric inventory appears to be dominated by micrometeorite vaporization of lunar grains. Sputtering effects are observable in the local plasma due to ion ejection, in the extended atmosphere through energetic neutral ejection, and on grain surfaces through the chemical fractionation of the redoposited sputter-ejecta. Ionization of the micrometeorite-vapor also contributes to the local plasma.

Johnson, R. E.↗
NASA NTRS1992

Evolutionary impact of sputtering of the Martian atmosphere by O(+) pickup ions

Calculations of solar wind-induced loss rates for evolving solar and atmospheric conditions like those described by Zhang et al. (1992), but including sputtering of the Martian atmosphere by reentering O(+) pickup ions, are described. The inclusion of the sputter loss increases by about 30 percent the cumulative estimated loss of oxygen to that in about 50 m of water (global surface depth) over the last 3.5 billion years. These ions also sputter CO2 and its fragments in substantial amounts. That integrated loss is equivalent to about 0.14 bar atmospheric CO2 pressure, of the order of some estimates of Mars' early atmospheric inventory.

Luhmann, J. G.↗
NASA NTRS1993

Sputtering of cobalt and chromium by argon and xenon ions near the threshold energy region

Sputtering yields of cobalt and chromium by argon and xenon ions with energies below 50 eV are reported. The targets were electroplated on copper substrates. Measurable sputtering yields were obtained from cobalt with ion energies as low as 10 eV. The ion beams were produced by an ion gun. A radioactive tracer technique was used for the quantitative measurement of the sputtering yield. Co-57 and Cr-51 were used as tracers. The yield-energy curves are observed to be concave, which brings into question the practice of finding threshold energies by linear extrapolation.

Handoo, A. K.↗
NASA NTRS1994

Mars atmospheric loss and isotopic fractionation by pick-up-ion sputtering and photochemical escape

We examine the effects of loss of constituents of the Martian atmosphere due to sputtering by solar-wind pick-up ions and photochemical escape during the last 3.8 billion years. Sputtering is capable of efficiently removing species from the upper atmosphere to space, including the light noble gases; nitrogen and oxygen are removed by both sputtering ad photochemical processes. Due to diffusive separation (by mass) above the homopause, removal from the top of the atmosphere will fractionate the isotopes of each species, with the lighter isotope being preferentially lost. This allows current measurements of the isotopic ratios to be used as a measure of the atmospheric evolution as integrated over geologic time. For carbon and oxygen, isotopic fractionation is buffered by exchange of atmospheric species with non-atmospheric reservoirs of CO2 and H2O. This allows us to determine the size of the non-atmospheric reservoirs which are capable of mixing with the atmosphere; these reservoirs can be CO2 absorbed in the regolith and/or H2O in the polar ice caps. Such an exchangeable reservoir is required in order to keep the fractionation of the atmospheric gases as low as is observed.

Jakosky, B. M.↗
NASA NTRS1999

Low Energy Sputtering Experiments for Ion Engine Lifetime Assessment

The sputtering yield of molybdenum under xenon ion bombardment was measured using a Quartz Crystal Microbalance. The measurements were made for ion kinetic energies in the range 100-1keV on molybdenum films deposited by magnetron sputtering in conditions optimized to reproduce or approach bulk-like properties. SEM micrographs for different anode bias voltages during the deposition are compared, and four different methods were implemented to estimate the density of the molybdenum films. A careful discussion of the Quartz Crystal Microbalance is proposed and it is shown that this method can be used to measure mass changes that are distributed unevenly on the crystal electrode surface, if an analytical expression is known for the differential mass-sensitivity of the crystal and the erosion profile. Finally, results are presented that are in good agreement with previously published data, and it is concluded that this method holds the promise of enabling sputtering yield measurements at energies closer to the threshold energy in the very short term.

Duchemin Olivier B.↗
NASA NTRS2002

Sputtering Erosion Measurement on Boron Nitride as a Hall Thruster Material

The durability of a high-powered Hall thruster may be limited by the sputter erosion resistance of its components. During normal operation, a small fraction of the accelerated ions will impact the interior of the main discharge channel, causing its gradual erosion. A laboratory experiment was conducted to simulate the sputter erosion of a Hall thruster. Tests of sputter etch rate were carried out using 300 to 1000 eV Xenon ions impinging on boron nitride substrates with angles of attack ranging from 30 to 75 degrees from horizontal. The erosion rates varied from 3.41 to 14.37 Angstroms/[sec(mA/sq cm)] and were found to depend on the ion energy and angle of attack, which is consistent with the behavior of other materials.

Britton, Melissa↗
NASA NTRS2003

Differential Sputtering Behavior of Pyrolytic Graphite and Carbon-Carbon Composite Under Xenon Bombardment

A differential sputter yield measurement technique is described, which consists of a quartz crystal monitor that is swept at constant radial distance from a small target region where a high current density xenon ion beam is aimed. This apparatus has been used to characterize the sputtering behavior of various forms of carbon including polycrystalline graphite, pyrolytic graphite, and PVD-infiltrated and pyrolized carbon-carbon composites. Sputter yield data are presented for pyrolytic graphite and carbon-carbon composite over a range of xenon ion energies from 200 eV to 1 keV and angles of incidence from 0 deg (normal incidence) to 60 deg .

Williams, John D.↗