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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 253 records · Page 14
All sourcesNASA NTRSDOE OSTI
NASA NTRS1973

Contamination Effects of Getter Ion and Titanium Sublimation Pumped Systems on Optical Surfaces

Previous studies have indicated that ultraclean vacuum can be produced when titanium sublimation pumps are used in conjunction with getter-ion pumps. Experiments are described in which the degrees of cleanliness of a typical getter-ion, titanium sublimation-pumped system were monitored by measuring the effects of surface contamination on the reflectance of evaporated vacuum ultraviolet mirrors. Results are presented which indicate that severe reflectance losses occurred when startup of a getter-ion pump was initiated at too high a chamber pressure. Significant reflectance losses also occurred as a result of titanium sublimation-pump operation. These data are reviewed and recommendations for improved system performance are presented.

Visentine, James T.↗
NASA NTRS1994

Neutral Ion Figuring of Chemical Vapor Deposited SiC

Ion figuring of optical components is a relatively new technology that can alleviate some of the problems associated with traditional contact polishing. Because the technique is noncontacting, edge distortions and rib structure print through do not occur. This investigation was aimed at determining the effect of ion figuring on surface roughness of previously polished or ductile ground ceramic optical samples. This is the first step in research directed toward the combination of a prefinishing process (ductile grinding or polishing) with ion figuring to produce finished ceramic mirrors. Multiple, chemical vapor deposited silicon carbide (CVD SiC) samples were polished or ductile ground to specular or near-specular roughness. These samples were then characterized to determine topographic surface information. The surface evaluation consisted of stylus profilometry, interferometry, and optical and scanning electron microscopy. The surfaces were then ion machined to depths from 0 to 5 micron. The finished surfaces were characterized to evaluate the effects of the ion-machining process with respect to the previous processing methods and the preexisting subsurface damage. This study provides some of the information required to effectively utilize a combined ductile grinding or polishing with ion machining as a procedure for figuring optical components.

Fawcett, Steven C.↗
NASA NTRS1994

Neutral ion sources in precision manufacturing

Ion figuring of optical components is a relatively new technology that can alleviate some of the problems associated with traditional contact polishing. Because the technique is non contacting, edge distortions and rib structure print through do not occur. This initial investigation was aimed at determining the effect of ion figuring on surface roughness of previously polished or ductile ground ceramic optical samples. This is the first step in research directed toward the combination of a pre-finishing process (ductile grinding or polishing) with ion figuring to produce finished ceramic mirrors. The second phase of the project is focusing on the development of mathematical algorithms that will deconvolve the ion beam profile from the surface figure errors so that these errors can be successfully removed from the optical components. In the initial phase of the project, multiple, chemical vapor deposited silicon carbide (CVD SiC) samples were polished or ductile ground to specular or near-specular roughness. These samples were then characterized to determine topographic surface information. The surface evaluation consisted of stylus profilometry, interferometry, and optical and scanning electron microscopy. The surfaces, were ion machined to depths from 0-5 microns. The finished surfaces were characterized to evaluate the effects of the ion machining process with respect to the previous processing methods and the pre-existing subsurface damage. The development of the control algorithms for figuring optical components has been completed. These algorithms have been validated with simulations and future experiments have been planned to verify the methods. This paper will present the results of the initial surface finish experiments and the control algorithms simulations.

Fawcett, Steven C.↗
NASA NTRS1978

Inversion of the resonance line of Sr/+/ produced by optically pumping Sr atoms

A description is presented of an experiment which demonstrates the selective production of excited-state ions by an optical absorption from neutrals. An inversion on the resonance line of Sr(+) was produced by laser excitation of a two-electron transition, followed by ionization of one of the excited electrons by the same laser. A pulsed, mode-locked laser operating at 2680 A was used to excite atoms from the Sr ground level. The same laser then ionized the excited atoms. The 2680-A pump beam was generated by frequency doubling the output of a synchronously pumped mode-locked dye laser in a KDP crystal. It is pointed out that the reported results are significant for the construction of vacuum-ultraviolet and X-ray lasers. Many of the proposed methods for making such lasers depend on the selective production of excited-state ions.

Green, W. R.↗
NASA NTRS1996

Investigation of ion-beam machining methods for replicated x-ray optics

The final figuring step in the fabrication of an optical component involves imparting a specified contour onto the surface. This can be expensive and time consuming step. The recent development of ion beam figuring provides a method for performing the figuring process with advantages over standard mechanical methods. Ion figuring has proven effective in figuring large optical components. The process of ion beam figuring removes material by transferring kinetic energy from impinging neutral particles. The process utilizes a Kaufman type ion source, where a plasma is generated in a discharge chamber by controlled electric potentials. Charged grids extract and accelerate ions from the chamber. The accelerated ions form a directional beam. A neutralizer outside the accelerator grids supplies electrons to the positive ion beam. It is necessary to neutralize the beam to prevent charging workpieces and to avoid bending the beam with extraneous electro-magnetic fields. When the directed beam strikes the workpiece, material sputters in a predicable manner. The amount and distribution of material sputtered is a function of the energy of the beam, material of the component, distance from the workpiece, and angle of incidence of the beam. The figuring method described here assumes a constant beam removal, so that the process can be represented by a convolution operation. A fixed beam energy maintains a constant sputtering rate. This temporally and spatially stable beam is held perpendicular to the workpiece at a fixed distance. For non-constant removal, corrections would be required to model the process as a convolution operation. Specific figures (contours) are achieved by rastering the beam over the workpiece at varying velocities. A unique deconvolution is performed, using series-derivative solution developed for the system, to determine these velocities.

Drueding, Thomas W.↗
NASA NTRS1976

Fifteen cm mercury ion thruster research, 1976

Improvements in 15 cm diameter, SERT II, mercury ion thruster performance effected by the use of SHAG optics at 33 V discharge voltage were discussed. At a 200 eV/ion discharge power, 90 percent propellant utilization and 660 mA beam current condition a doubly-to-singly charged ion current ratio of about 4 percent was measured. Performance of the 15 cm multipole mercury thruster (optimized for length and the point of electron injection) was compared to that of divergent (SERT II) and cusped field designs and found to be comparable. The need for a magnetic baffle in the multipole thruster was identified and the preferred point of electron injection was at the upstream end of the discharge chamber. Results of preliminary tests on the effects of discharge voltage and total accelerating voltage on perveance and beam divergence characteristics of two grid ion optics were examined. Experimental data showing the effect of target temperature on sputtering rates in a mercury discharge environment were presented and a deficiency in the tests procedure was identified.

Wilbur, P. J.↗
NASA NTRS1964

Ion bombardment and its effects on the optical properties of metals

An experimental program, to evaluate the change in total hemispherical emittance and solar absorptance of engineering metals used on spacecraft and in spacecraft instrumentation systems, is presented. Three materials, titanium alloy, pure aluminum, and electrolytic copper, were used in the experiment. Results show that emittance, absorptance, and alpha/epsilon ratio of the materials were changed by ion bombardment. The time before the change occurs depends upon the material used, the intensity of bombardment, and the environment assumed.

Anderson, D. L.↗
NASA NTRS1982

Recent developments and proposed schemes for trapped ion frequency standards

Ion traps are exciting candidates as future precision frequency sources. Recent developments demonstrate that mercury ion frequency standards are capable of a stability performance comparable to commercial cesium standards. There is, however, considerable room for improvement with regard to the signal to noise problem. The 40 GHz microwave frequency implies that a careful design should be implemented to ensure the elimination of the unwanted side bands in the microwave pump signal. A long life, high performance light source to be used in a trapped mercury ion microwave standard must be developed and the long term performance of a trapped mercury ion microwave standard must be investigated. While newly proposed two photon pumping schemes in conjuction with mercury ions promise exciting developments for both microwave and optical frequency standards, other ions that may be potential candidates should be evaluated for their usefulness.

Maleki, L.↗
NASA NTRS2000

Fracture Tests of Etched Components Using a Focused Ion Beam Machine

Many optical MEMS device designs involve large arrays of thin (0.5 to 1 micron components subjected to high stresses due to cyclic loading. These devices are fabricated from a variety of materials, and the properties strongly depend on size and processing. Our objective is to develop standard and convenient test methods that can be used to measure the properties of large numbers of witness samples, for every device we build. In this work we explore a variety of fracture test configurations for 0.5 micron thick silicon nitride membranes machined using the Reactive Ion Etching (RIE) process. Testing was completed using an FEI 620 dual focused ion beam milling machine. Static loads were applied using a probe. and dynamic loads were applied through a piezo-electric stack mounted at the base of the probe. Results from the tests are presented and compared, and application for predicting fracture probability of large arrays of devices are considered.

Kuhn, Jonathan, L.↗
NASA NTRS1987

Constrained sheath optics for high thrust density, low specific impulse ion thrusters

The results of an experimental study showing that a contoured, fine wire mesh attached to the screen grid can be used to control the divergence characteristics of ion beamlets produced at low net-to-total accelerating voltage ratios are presented. The influence of free and constrained-sheath optics systems on beamlet divergence characteristics are found to be similar in the operating regime investigated, but it was found that constrained-sheath optics systems can be operated at higher perveance levels than free-sheath ones. The concept of a fine wire interference probe that can be used to study ion beamlet focusing behavior is introduced. This probe is used to demonstrate beamlet focusing to a diameter about one hundreth of the screen grid extraction aperture diameter. Additional testing is suggested to define an optimally contoured mesh that could yield well focused beamlets at net-to-total accelerating voltage ratios below about 0.1.

Wilbur, Paul J.↗
NASA NTRS1971

Measurement of lattice damage caused by ion-implantation doping of semiconductors.

Discussion of two new techniques used to measure the lattice damage produced in GaAs by the implantation of 60 keV cadmium ions. In the first method, optical reflection spectra of the ion-implanted samples were measured in the wavelength range from 2000 to 4600 A. The decrease in reflectivity resulting from ion-implantation was used to determine the relative amount of lattice damage as a function of ion dose. The second technique employed the scanning electron microscope. Patterns very similar in appearance to Kikuchi electron diffraction patterns are obtained when the secondary and/or backscattered electron intensity is displayed as a function of the angle of incidence of the electron beam on a single crystal surface. The results of measurements made by both methods are compared with each other and with data obtained by the method of measuring lattice damage by Rutherford scattering of 1 MeV helium ions.

Hunsperger, R. G.↗
NASA NTRS1991

Electric propulsion system technology

The work performed on the Ion Propulsion System Technology Task in FY90 is described. The objectives of this work fall under two broad categories. The first of these deals with issues associated with the application of xenon ion thrusters for primary propulsion of planetary spacecraft, and the second with the investigation of technologies which will facilitate the development of larger, higher power ion thrusters to support more advanced mission applications. Most of the effort was devoted to investigation of the critical issues associated with the use of ion thrusters for planetary spacecraft. These issues may be succinctly referred to as life time, system integration, and throttling. Chief among these is the engine life time. If the engines do not have sufficient life to perform the missions of interest, then the other issues become unimportant. Ion engine life time was investigated through two experimental programs: an investigation into the reduction of ion engine internal sputter erosion through the addition of small quantities of nitrogen, and a long duration cathode life test. In addition, a literature review and analysis of accelerator grid erosion were performed. The nitrogen addition tests indicated that the addition of between 0.5 and 1.0 percent of nitrogen by mass to the xenon propellant results in a reduction in the sputter erosion of discharge chamber components by a factor of between 20 and 50, with negligible reduction in thruster performance. The long duration test of a 6.35-mm dia. xenon hollow cathode is still in progress, and has accumulated more than 4,000 hours of operation at an emission current of 25 A at the time of this writing. One of the major system integration issues concerns possible interactions of the ion thruster produced charge exchange plasma with the spacecraft. A computer model originally developed to describe the behavior of mercury ion thruster charge exchange plasmas was resurrected and modified for xenon propellant. This model enables one to calculate the flow direction and local density of the charge exchange plasma, and indicates the degree to which this plasma can flow upstream of the thruster exhaust plane. A continuing effort to investigate the most desirable throttling technique for noble gas ion thrusters concentrated this year on experimentally determining the fixed flow rate throttling range of a 30-cm dia. thruster with a two-grid accelerator system. These experiments demonstrated a throttling capability which covers a 2.8 to 1 variation in input power. This throttling range is 55 percent greater than expected, and is due to better accelerator system performance at low net-to-total voltage ratios than indicated in the literature. To facilitate the development of large, higher power ion thrusters several brief studies were performed. These include the development of a technique which simulates ion thruster operation without beam extraction, the development of an optical technique to measure ion thruster grid distortion due to thermal expansion, tests of a capacitance measurement technique to quantify the accelerator system grid separation, and the development of a segmented thruster geometry which enables near term development of ion thrusters at power levels greater than 100 kW. Finally, a paper detailing the benefits of electric propulsion for the Space Exploration Initiative was written.

Brophy, John R.↗
NASA NTRS2007

Slot-Antenna/Permanent-Magnet Device for Generating Plasma

A device that includes a rectangular-waveguide/slot-antenna structure and permanent magnets has been devised as a means of generating a substantially uniform plasma over a relatively large area, using relatively low input power and a low gas flow rate. The device utilizes electron cyclotron resonance (ECR) excited by microwave power to efficiently generate plasma in a manner that is completely electrodeless in the sense that, in principle, there is no electrical contact between the plasma and the antenna. Plasmas generated by devices like this one are suitable for use as sources of ions and/or electrons for diverse material-processing applications (e.g., etching or deposition) and for ion thrusters. The absence of plasma/electrode contact essentially prevents plasma-induced erosion of the antenna, thereby also helping to minimize contamination of the plasma and of objects exposed to the plasma. Consequently, the operational lifetime of the rectangular-waveguide/ slot-antenna structure is long and the lifetime of the plasma source is limited by the lifetime of the associated charged-particle-extraction grid (if used) or the lifetime of the microwave power source. The device includes a series of matched radiating slot pairs that are distributed along the length of a plasma-source discharge chamber (see figure). This arrangement enables the production of plasma in a distributed fashion, thereby giving rise to a uniform plasma profile. A uniform plasma profile is necessary for uniformity in any electron- or ion-extraction electrostatic optics. The slotted configuration of the waveguide/ antenna structure makes the device scalable to larger areas and higher powers. All that is needed for scaling up is the attachment of additional matched radiating slots along the length of the discharge chamber. If it is desired to make the power per slot remain constant in scaling up, then the input microwave power must be increased accordingly. Unlike in prior ECR microwave plasma-generating devices, there is no need for an insulating window on the antenna. Such windows are sources of contamination and gradually become ineffective as they become coated with erosion products over time. These characteristics relegate prior ECR microwave plasma-generating devices to non-ion beam, non-deposition plasma applications. In contrast, the lack of need for an insulating window in the present device makes it possible to use the device in both ion-beam (including deposition) and electron-beam applications. The device is designed so that ECR takes place above each slot and the gradient of the magnetic field at each slot is enough to prevent backflow of plasma.

Foster, John E.↗
NASA NTRS1979

Shock waves in the interstellar medium

Calculations of the optical and UV emission-line intensities and column densities of ions observable in the optical and UV are presented for plane-parallel steady-state shock waves in the interstellar medium. The range of shock velocities considered is from 50 to 200 km/s, and preshock densities are between 1 and 300 per cu cm. The ionization state of the preshock gas is found to be an important parameter, and several sets of elemental abundances corresponding to various amounts of depletion onto grains are used. The results are compared with observations of the Cygnus Loop, the Vela supernova remnant, and Herbig-Haro objects.

Raymond, J. C.↗
NASA NTRS1997

Third Order Optical Nonlinearity of Colloidal Metal Nanoclusters Formed by MeV Ion Implantation

We report the results of characterization of nonlinear refractive index of the composite material produced by MeV Ag ion implantation of LiNbO(sub 3) crystal (z-cut). The material after implantation exhibited a linear optical absorption spectrum with the surface plasmon peak near 430 nm attributed to the colloidal silver nanoclusters. Heat treatment of the material at 500 deg C caused a shift of the absorption peak to 550 nm. The nonlinear refractive index of the sample after heat treatment was measured in the region of the absorption peak with the Z-scan technique using a tunable picosecond laser source (4.5 ps pulse width).The experimental data were compared against the reference sample made of MeV Cu implanted silica with the absorption peak in the same region. The nonlinear index of the Ag implanted LiNbO(sub 3) sample produced at five times less fluence is on average two times greater than that of the reference.

Sarkisov, S. S.↗