Projection Microstereolithography for Architected Materials
Stereolithography (SL) is a prominent paradigm in the realm of additive manufacturing (AM) technologies, which refers to fabrication approaches that build “bottom up” by adding material. Pioneered in 1984 by Chuck Hull, SL relies on light-activated solidification of a liquid photosensitive resin in a layer-by-layer fashion, with the geometry of each layer defined by sectioning a three-dimensional (3D) computer model by closely-spaced parallel planes. The maturation of the technology over nearly three subsequent decades has resulted in the wide availability of commercial SL products, such as the ProJet series from 3D Systems, Inc. (which uses the proprietary acronym SLA to refer to SL technology), which routinely produces parts with 50-100 µm resolution in all three axes, and overall dimensions of 0.25-0.5 m. In the most general terms, advancements in SL technology have generally been aimed at achieving four goals: decreasing (1) system cost and (2) minimum feature size (i.e. improving resolution), while (3) increasing overall part size and (4) build speed. SL systems can be broadly categorized into two classes, by the way in which they deliver illumination to produce the shape of each object layer to be fabricated: laser-scanning and mask projection approaches. Commercially-available SL systems incorporate the laser-scanning approach, following the original scheme described by Hull, since digital image projection technology has only emerged relatively recently as a viable alternative. A significant limitation of laser scanning is the relatively slow speed of rastering the laser to form each layer’s pattern, highlighting the need for a dynamic mask-based approach to polymerize larger areas in a single exposure. The recent proliferation of digital display technologies (referred to as spatial light modulators or SLMs) has enabled the implementation of such “dynamic masking,” increasing system throughput by allowing a complete image layer to be cross-linked simultaneously. These mask projection SL systems are gaining greater prominence, and the landscape of some of the parameters available for system design, as implemented in recent work by a variety of investigators, has been reviewed by Lambert et al.