Characteristics and potential applications of orbiting ultrahigh vacuum facilities
The characteristics of an orbiting molecular shield ultrahigh vacuum facility are described and some examples of potential applications are discussed. Published results of a kinetic theory analysis are given. Densities within the shield of less than 1000 molecules/cu cm can be obtained allowing high purity materials processing experiments to be performed in orbit under the simultaneous conditions of ultrahigh vacuum and microgravity. Two specific experiments are discussed: the production of ultrapure materials by the electrotransport technique developed at ERDA's Ames Laboratory, Iowa State University, and the vapor deposition and space preparation of silicon solar cells.