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Lynx Mission Concept Status

Lynx is a concept under study for prioritization in the 2020 Astrophysics Decadal Survey. Providing orders of magnitude increase in sensitivity over Chandra, Lynx will examine the first black holes and their galaxies, map the large-scale structure and galactic halos, and shed new light on the environments of young stars and their planetary systems. In order to meet the Lynx science goals, the telescope consists of a high-angular resolution optical assembly complemented by an instrument suite that may include a High Definition X-ray Imager, X-ray Microcalorimeter and an X-ray Grating Spectrometer. The telescope is integrated onto the spacecraft to form a comprehensive observatory concept. Progress on the formulation of the Lynx telescope and observatory configuration is reported in this paper.

Gaskin, Jessica A.↗

The LUVOIR Surveyor: Decadal Mission Concept Update

The Large Ultraviolet/Optical/Infrared (LUVOIR) Science and Technology Definition Team (STDT) identified a broad range of science objectives for LUVOIR that include the direct imaging and spectral characterization of habitable exoplanets and an array of general astrophysics and Solar System observations. To meet these objectives, the LUVOIR Study Office completed the first design iteration of a 15-m segmented-aperture observatory that includes four serviceable instruments: the Extreme Coronagraph for Living Planetary Systems (ECLIPS); the LUVOIR UV Multi-object Spectrograph (LUMOS); the High Definition Imager (HDI); and Pollux, a high-resolution UV spectro-polarimeter being contributed by Centre National d'Etudes Spatiales (CNES). The study team is now executing a second design iteration to further improve upon the 15-m concept, while simultaneously studying a 9-m concept. In these proceedings, we provide an update on these architectures.

LUVOIR↗

Progress of Coating Stress Compensation of Silicon Mirrors for Lynx X-ray Telescope Mission Concept Using Thermal Oxide Patterning Method

A thermal oxide patterning method has proven to be effective for correcting coating-stress-induced distortion on flat silicon wafers. We report progress on developing this method for correcting curved silicon mirrors distorted by front-side iridium coatings. Owing to the difference in geometry, a finite element model has been established to calculate the appropriate duty cycle maps in thermal oxide hexagon patterns used for compensation. In addition, a photolithographic process, along with three-dimensional printed equipment, has been developed for creating patterns precisely on the back side of curved mirrors. The developed method has been used to recover the original surface shape of two silicon mirrors which are 100-mm long, 0.5-mm thick, having 312-mm radius of curvature, and 30 deg in azimuthal span (Wolter-I geometry). These mirrors’ front sides are sputter-coated by 20-nm iridium layers with ∼-70 N∕m integrated stress. Measurement results show that the developed method can mitigate coating-induced distortion by a factor of ∼5 in RMS height and ∼4 in RMS slope error, corresponding to ∼0.5 arc sec RMS slope error. Residual errors after correction are dominated by midfrequency ripples created during the annealing process, which will be resolved in the future. The presented method is precise and inexpensive and a potential candidate for resolving the coating stress issue for Lynx optics in the future.

x-ray↗