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Steady state potential distributions near photoemitting plate immersed in plasma, noting over-shoot effects role for sheaths around satellites in interplanetary plasma
The investigation 'Dusty Plasma Dynamics Near Surfaces in Space' is an experimental and theoretical study of the dynamics of dust particles on airless bodies in the solar system in the presence of a photoelectron sheath generated by solar ultraviolet light impinging on the surface. Solar UV illumination of natural and manmade surfaces in space produces photoelectrons which form a plasma sheath near the surface. Dust particles on the surface acquire a charge and may be transported by electric fields in the photoelectron sheath generated by inhomogeneities in the surface or the illumination (such as shadows). The sheath itself has a finite vertical extent leading to (at least) an electric field normal to the illuminated surface. If dust particles are launched from the surface by some other process, such as meteoroid impact, or spacecraft activity on the surface, these grains become charged and move under the influence of gravity and the electric field. This can give rise to suspension of the particles above the surface, loss from the parent body entirely (if accelerated beyond escape velocity), and a different distribution of dust ejecta from what would be expected with purely gravitational dynamics.
Linear plasma devices used to test plasma facing materials (PFMs) and components for fusion reactors are often suffering under the production of intrinsic impurities from the plasma source system. Most linear plasma devices use internal electrodes (hollow cathodes, reflex arc, or cascading arc), which typically are the source of the main impurities. The next-generation plasma generators use radio frequency (RF) plasma sources like helicons to avoid internal electrodes. However, high power operation of helicons has proven to result in impurity production due to the high rectified sheath voltages created. Depending on the plasma parameters and magnetic configuration, these impurities can be transported to the target and deposited there to unacceptable high levels. Here, in this contribution, the experimental results from Proto-MPEX are summarized, and the conclusions of the impurity source physics are given. Methods to reduce the impurity production, the impurity transport, and the net deposition on the target are presented. These methods to reduce the impurity production include Faraday screens to reduce the sheath voltage drop, high-Z refractory coatings to reduce the erosion yield, and wall conditioning methods. Methods to reduce the impurity transport include changes in the magnetic configuration as well as electron heating to change axial and radial temperature profiles. Preliminary results on the effectiveness of some of these methods are presented.
A simple model describing the process of electron collection from a low pressure ambient plasma in the absence of magnetic field and contactor velocity effects is presented. Experimental measurments of the plasma surrounding the contactor are used to demonstrate that a double-sheath generally develops and separates the ambient plasma from a higher density, anode plasma located adjacent to the contactor. Agreement between the predictions of the model and experimental measurements obtained at the electron collection current levels ranging to 1 A suggests the surface area at the ambient plasma boundary of the double-sheath is equal to the electron current being collected divided by the ambient plasma random electron current density; the surface area of the higher density anode plasma boundary of the double-sheath is equal to the ion current being emitted across this boundary divided by the ion current density required to sustain a stable sheath; and the voltage drop across the sheath is determined by the requirement that the ion and electron currents counterflowing across the boundaries be at space-charge limited levels. The efficiency of contactor operation is shown to improve when significant ionization and excitation is induced by electrons that stream from the ambient plasma through the double-sheath and collide with neutral atoms being supplied through the hollow cathode.
During an Extravehicular Activity (EVA), if the Extravehicular Mobility Unit (EMU) makes galvanic contact with the International Space Station (ISS), a negative Floating Potential (FP) can lead to an arcing hazard when it exceeds -45.5 V, and a positive FP can produce a DC current high enough to stimulate the astronaut’s muscles (5 mA), and also cause a hazard. The Boeing Space Environments team developed and utilizes a Plasma Interaction Model (PIM) in order to calculate the ISS FP based on the plasma environment, ISS velocity, geomagnetic field, solar array and ISS orientation, and solar array regulation to support EVA planning operations. Presently, the model excludes the sheath capacitance, resulting in the total potential drop being across the dielectric surface of the vehicle. Data from the Floating Potential Measurement Unit (FPMU) show this assumption to be generally true. However, Rapid Charging Events (RCE) are often observed in the FPMU data at eclipse exit when the electron number density, Ne, is low (less than 5(sub e)10 m (exp-3)). During these events, the FP can rise more than 40 V in one to five seconds. There is then a relaxation phase where the FP drops back to the normal FP values. The PIM model is not capable of producing these RCEs. It was thought that the inclusion of the sheath in PIM could improve the charging predictions, particularly as related to RCEs. A parametric study was performed to determine what portion of the measured FP is across the sheath for a range of Ne experienced by the ISS, and if the inclusion of the sheath in PIM is necessary. Results show that the potential drop across the sheath is negligible at times when the N(sub e) is greater than 1(sub e)11 m-3. However, there appears to be a transitional region between 1(sub e)10 m(exp -3) and 1(sub e)11 m(exp -3) where the sheath capacitance becomes more significant. During those conditions the potential drop across the sheath can be larger than the potential drop across the dielectric for short periods (1-5 seconds). These results agree remarkably well with measurements made by the FPMU. The inclusion of the sheath explains why high charging measurements occur when the Ne is low at eclipse exit and even times when the solar arrays are not a significant driver (i.e., potentials often rise as the ISS flies through spread-F). Results also show that the RCEs are not a safety concern because the potential drop across the dielectric surface does not exceed -45.5 V. In that case, the EMU would not arc. This gives high confidence in the low probability of an arcing hazard occurring.
Excitation of surface currents on plasma-immersed cylinder by electromagnetic and electrokinetic waves - vacuum and inhomogeneous sheath models
A design study was conducted concerning a proposed shuttle-borne space laboratory for research on magnetospheric and plasma physics. A worldwide survey found two broad research disciplines of interest: geophysical studies of the dynamics and structure of the magnetosphere (including wave characteristics, wave-particle interactions, magnetospheric modifications, beam-plasma interactions, and energetic particles and tracers) and plasma physics studies (plasma physics in space, wake and sheath studies, and propulsion and devices). The Plasma Physics and Environmental Perturbation Laboratory (PPEPL) designed to perform experiments in these areas will include two 50-m booms and two maneuverable subsatellites, a photometer array, standardized proton, electron, and plasma accelerators, a high-powered transmitter for frequencies above 100 kHz, a low-power transmitter for VLF and below, and complete diagnostic packages. Problem areas in the design of a space plasma physics laboratory are indicated.
The objective of the research was to study the temporally and spatially resolved dynamics of sheath formation in a nanosecond pulsed plasma generated in a parallel plate electrode geometry at near atmospheric pressures. We have performed LIF dip measurements at the Sandia Low-Temperature Plasma Research Facility showing the capability to measure electric fields in near atmospheric pressure plasmas although with insufficient spatial resolution near the electrodes. Stark polarization spectroscopy implemented at the University of Minnesota was shown to be able to probe the formation of the sheaths in nanosecond pulsed plasmas. Within 30 ns, a reduction of the sheath thickness to about 250 μm is observed, coinciding with a gradual increase of the discharge current and proportional increase in electric field at the cathode. The electric field evolution as obtained by the fluid model is in excellent agreement with the measurements and shows that an enhanced ionization near the cathode is causing the space charge formation responsible for the increase in electric field. High resolution Stark polarization spectroscopy showed sheaths with dimensions of the order of 50 μm underlining the need of micrometer spatial resolution for sheath characterization in near atmospheric pressure.
In plasma etching reactors, the structure surrounding the wafer, often called a focus ring (FR), plays an important role in maintaining uniform fluxes of reactants across the wafer. The FR is typically made of dielectric materials. During the plasma etching process, the sheath that forms over the wafer to accelerate ions anisotropically into the surface extends over the FR. Electrical charging of the FR modifies the sheath relative to that over the wafer. On the one hand, one wants the sheath to be uniform across the wafer-FR boundary to enable uniform fluxes to the edge of the wafer. On the other hand, maintaining a high voltage sheath over the FR will erode the FR, which is undesirable as the FR is a consumable component that must be periodically replaced in high volume manufacturing. In this work, we computationally investigated the consequences of dielectric constant ε of the FR materials on erosion of the FR. The series capacitance of the FR and its underlying structure is typically smaller than that of the wafer and its underlying structure. As a result, the FR charges quickly relative to the wafer, which then reduces the voltage across the sheath on top of the FR. The ion energy and angular distributions (IEADs) striking the FR are, therefore, generally lower in energy with a broader angular distribution. With ε = 2, the ion energies striking the middle to the outer edge of the FR are 30–180 eV, whereas for ε = 100, the ion energies are 120–380 eV. At the transition between the wafer and the FR, there is a skew in the IEAD as large as 15° that results from the difference in sheath thickness above the wafer and the FR. This skew and the erosion rate across the FR are functions of the dielectric constant of the FR material. With low ε, the FR charges quickly, less plasma is produced above the FR, and there is less voltage across the sheath that results in less FR erosion. Increasing ε of the FR produces a higher sheath voltage as well as higher ion fluxes over the FR, which increases erosion, while the skew at the edge of the wafer is less severe. Further, the material of the subsurface portion of the FR, which dominates its capacitance, is an important consideration in the design of the substrate assembly.
The quality of high aspect ratio (HAR) features etched into dielectrics for microelectronics fabrication using halogen containing low temperature plasmas strongly depends on the energy and angular distribution of the incident ions (IEAD) onto the wafer, as well as potentially that of the electrons (EEAD). Positive ions, accelerated to high energies by the sheath electric field, have narrow angular spreads and can penetrate deeply into HAR features. Electrons typically arrive at the wafer with nearly thermal energy and isotropic angular distributions and so do not directly penetrate deeply into features. These differences can lead to positive charging of the insides of the features that can slow etching rates and produce geometric defects such as twisting. In this work, we computationally investigated the plasma etching of HAR features into SiO 2 using tailored voltage waveforms in a geometrically asymmetric capacitively coupled plasma sustained in an Ar/CF 4 /O 2 mixture at 40 mTorr. The tailored waveform consisted of a sinusoidal wave and its higher harmonics with a fundamental frequency of 1 MHz. We found that some degree of control of the IEADs and EEADs is possible by adjusting the phase of higher harmonics φ through the resulting generation of electrical asymmetry and electric field reversal. However, the IEADs and EEADs cannot easily be separately controlled. The control of IEADs and EEADs is inherently linked. The highest quality feature was obtained with a phase angle φ = 0° as this value generated the largest (most negative) DC self-bias and largest electric field reversal for accelerating electrons into the feature. That said, the consequences of voltage waveform tailoring (VWT) on etched features are dominated by the change in the IEADs. Although VWT does produce EEADs with higher energy and narrower angular spread, the effect of these electrons on the feature compared to thermal electrons is not large. Finally, this smaller impact of VWT produced EEADs is attributed to thermal electrons being accelerated into the feature by electric fields produced by the positive in-feature charging.
Proto-MPEX (Materials Plasma Exposure eXperiment), a linear plasma device (LPD), using a high power radio frequency (RF) (⩾100 kW, 13.56 MHz) helicon plasma source, has suffered RF sheath-induced window erosion. The sputtered impurities from the window surface transport toward the downstream target affecting plasma-material interaction studies. The rectified sheath voltage formed was high enough to cause window erosion by light ions due to its low-Z components (e.g. Si 3 N 4 and AlN). Hence, we are proposing impurity mitigation strategies, which involve the application of a Faraday screen to lower the rectified sheath voltage and the application of high-Z refractory coatings on the existing window plasma-facing surface. In this work, we report the erosion of two different coatings, i.e., tantalum oxide (Ta 2 O 5 ) and hafnium oxide (HfO 2 ) on a silicon nitride (Si 3 N 4 ) window material under conditions of low-energy deuterium (D) ion impact, well below the Ta 2 O 5 sputtering energy threshold (i.e. 250 eV). The test samples were RF-biased and exposed to a high D-ion fluence (∼10 26 m −2 ) in Plasma Interaction with Surface Component Experimental Station (PISCES-A) LPD. The experimentally measured sputtering yields of the high-Z refractory coatings below the sputtering energy threshold of Ta 2 O 5 indicate an increased erosion due to the plasma impurities, especially due to oxygen. Improving the vacuum level could reduce the oxygen impurities and increase the lifespan of the coated helicon window for plasma operation. Post-surface analysis indicates no preferential erosion of oxygen or enrichment of the high-Z surface component. This is likely due to an effective energy transfer from the impurity ion for sputtering of the high-Z component in the coating. With the reduced rectified sheath voltage at the window surface and improved vacuum conditions, the proposed high-Z refractory coatings offer a promising solution for reducing window erosion in future MPEX plasma operations at ORNL.
The present investigation is concerned with measurements of the plasma potential profile of an expanding plasma, taking into account the demonstration of the self-similar behavior of such a plasma. The obtained experimental results are consistent with self-similar solutions reported by Crow et al. (1975). It is found that the quasi-neutrality condition breaks down early during the experiment. A consideration of the effect of charge separation is, therefore, required. Attention is given to the evolution of the potential profiles of the expanding plasma as a function of time, the accelerated ion fronts, and the sheath formation of the expanding plasma into a floating boundary.
This study applies the newly developed STRIPE (Simulated Transport of RF Impurity Production and Emission) framework to analyze tungsten (W) erosion at RF antenna structures in the WEST tokamak. STRIPE integrates SolEdge3x for edge plasma backgrounds, COMSOL for 3D RF sheath potentials, RustBCA for sputtering yields, and GITR for impurity transport and ion energy–angle distributions. Building on prior work by Kumar et al. (2025) Nuclear Fusion, 65, 076039, which validated STRIPE for WEST ICRH discharge #57877, the present study provides a spatially resolved assessment of gross W erosion at both Q2 antenna limiters under ohmic and ICRH conditions. Simulations using 2D SolEdge3x profiles in COMSOL capture rectified sheath potentials exceeding 300 V, leading to strong upper-limiter localization. Both poloidal and toroidal asymmetries are observed and attributed to RF sheath effects, with modeled erosion patterns deviating from experiment—highlighting sensitivity to sheath geometry and plasma resolution. Erosion is driven primarily by high-charge-state oxygen ions (O6+–O8+), while D+ plays a negligible role. Assuming a plasma composition of 1% oxygen and 98% deuterium, STRIPE predicts a 30-fold increase in gross W erosion from ohmic to ICRH phases, consistent with a >25-fold rise in W-I (400.9 nm) brightness. Quantitative agreement is within 5% in the ohmic phase and 30% under ICRH, demonstrating predictive capability. Importantly, the study shows that the magnitude of ICRH-driven W erosion depends strongly on the concentration of light impurities (O, B, N, C), which drive sputtering through high charge states. Cleaner plasma conditions with reduced impurity content are therefore expected to substantially mitigate antenna W sources in WEST and other toroidal fusion devices. These findings establish STRIPE as a predictive framework for RF-induced plasma–material interactions and support its application to reactor-scale antenna design.
Observations in the dawn magnetosheath with the LASL/MPI fast plasma experiment on ISEE 1 and 2 reveal the existence of two distinct states of plasma flow within the sheath: a quiet state and a disturbed state. Energetic ions in the range of 3-40 keV are the distinguishing feature of the disturbed state. Long period (about 1 min) fluctuations in plasma density, temperature, flow speed, and flow direction occur simultaneously with the appearance of these high-energy particles. The most likely explanation of these observations is that the energetic ions are produced in the vicinity of the bow shock under certain (unspecified) interplanetary conditions, and that the fluctuations in plasma flow are produced locally by the interaction of the energetic ions with the ambient plasma.
Recent data from ground and space experiments indicate that plasma releases from an object dramatically reduce the sheath impedance between the object and the ambient plasma surrounding it. Available data is in qualitative accord with the theory developed to quantify the flow of current in the sheath. Electron transport in the theory is based on a fluid model of a collisionless plasma with an effective collision frequency comparable to frequencies of plasma oscillations. The theory leads to low effective impedances varying inversely with the square root of the injected plasma density. To support such a low impedance mode of operation using an argon plasma source for example requires that only one argon ion be injected for each thirty electrons extracted from the ambient plasma. The required plasma flow rates are quite low; to extract one ampere of electron current requires a mass flow rate of about one gram of argon per day.
Recent data from ground and space experiments indicate that plasma releases from an object dramatically reduce the sheath impedance between the object and the ambient plasma surrounding it. Available data is in qualitative accord with the theory developed to quantify the flow of current in the sheath. Electron transport in the theory is based on a fluid model of a collisionless plasma with an effective collision frequency comparable to frequencies of plasma oscillations. The theory leads to low effective impedances varying inversely with the square root of the injected plasma density. To support such a low impedance mode of operation using an argon plasma source, for example, requires that only one argon ion be injected for each thirty electrons extracted from the ambient plasma. The required plasma flow rates are quite low; to extract one ampere of electron current requires a mass flow rate of about one gram of argon per day.
We propose a semianalytical ion dynamics model for a collisionless radio frequency biased sheath. The model uses bulk plasma conditions and electrode boundary condition to predict ion impact energy distribution and electrical properties of the sheath. The proposed model accounts for ion inertia and ion current modulation at bias frequencies that are of the same order of magnitude as the ion plasma frequency. A relaxation equation for ion current oscillations is derived which is coupled with a damped potential equation in order to model ion inertia effects. We find that inclusion of ion current modulation in the sheath model shows marked improvements in the predictions of sheath electrical properties and ion energy distribution function.
Methods for inferring the electron distribution function (EDF) from a probe current–voltage trace are reviewed for moderate-collisional plasma. The explicit accounting of particle collisions, modeling sheath depletion, and electron refilling processes are rarely performed when analyzing probe measurements, yet they are critical for regime validity, EDF-profile accuracy, and space potential quantification precision. Furthermore, the advantages, limitations, and utilization of large-area wall probes in moderate-collisional plasma, capable of highly resolved indications of energetic electrons in plasma, are outlined.