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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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All sourcesNASA NTRSDOE OSTI
NASA NTRS1992

CVD of silicon carbide on structural fibers - Microstructure and composition

Structural fibers are currently being considered as reinforcements for intermetallic and ceramic materials. Some of these fibers, however, are easily degraded in a high temperature oxidative environment. Therefore, coatings are needed to protect the fibers from environmental attack. Silicon carbide (SiC) was chemically vapor deposited (CVD) on Textron's SCS6 fibers. Fiber temperatures ranging from 1350 to 1500 C were studied. Silane (SiH4) and propane (C2H8) were used for the source gases and different concentrations of these source gases were studied. Deposition rates were determined for each group of fibers at different temperatures. Less variation in deposition rates were observed for the dilute source gas experiments than the concentrated source gas experiments. A careful analysis was performed on the stoichiometry of the CVD SiC coating using electron microprobe. Microstructures for the different conditions were compared. At 1350 C, the microstructures were similar; however, at higher temperatures, the microstructure for the more concentrated source gas group were porous and columnar in comparison to the cross sections taken from the same area for the dilute source gas group.

Veitch, Lisa C.↗
NASA NTRS1994

System for the growth of bulk SiC crystals by modified CVD techniques

The goal of this program was the development of a SiC CVD growth of films thick enough to be useful as pseudo-substrates. The cold-walled CVD system was designed, assembled, and tested. Extrapolating from preliminary evaluation of SiC films grown in the system at relatively low temperatures indicates that the growth rate at the final temperatures will be high enough to make our approach practical. Modifications of the system to allow high temperature growth and cleaner growth conditions are in progress. This program was jointly funded by Wright Laboratory, Materials Directorate and NASA LeRC and monitored by NASA.

Steckl, Andrew J.↗
NASA NTRS1997

Creep and Rupture Strength of an Advanced CVD SiC Fiber

In the as-produced condition the room temperature strength (approx. 6 GPa) of Textron Specialty Materials' 50 microns CVD SiC fiber represents the highest value thus far obtained for commercially produced polycrystalline SiC fibers. To understand whether this strength can be maintained after composite processing conditions, high temperature studies were performed on the effects of time, stress, and environment on 1400 deg. C tensile creep strain and stress rupture on as-produced, chemically vapor deposited SiC fibers. Creep strain results were consistent, allowing an evaluation of time and stress effects. Test environment had no influence on creep strain but I hour annealing at 1600 deg. C in argon gas significantly reduced the total creep strain and increased the stress dependence. This is attributed to changes in the free carbon morphology and its distribution within the CVD SiC fiber. For the as-produced and annealed fibers, strength at 1400 deg. C was found to decrease from a fast fracture value of 2 GPa to a 100-hr rupture strength value of 0. 8 GPa. In addition a loss of fast fracture strength from 6 GPa is attributed to thermally induced changes in the outer carbon coating and microstructure. Scatter in rupture times made a definitive analysis of environmental and annealing effects on creep strength difficult.

Goldsby, J. C.↗
NASA NTRS1996

Dopant Incorporation Efficiency in CVD Silicon Carbide Epilayers

In order to ensure reproducible and reliable SiC semiconductor device characteristics, controlled dopant incorporation must be accomplished. Some of the many factors which greatly influence dopant incorporation are the site-competition effect, SiC(0001) substrate polarity, substrate temperature, and the dopant-source reactor concentration. In this paper, dopant incorporation is considered and compared for various dopants in the context of dopant incorporation efficiency. By using secondary ion mass spectrometry (SIMS), the relative dopant incorporation efficiencies were calculated by dividing the SIMS determined dopant concentration in the resulting epitaxial layer by the intentional gas phase dopant concentration used during the SiC CVD. Specifically, the relative magnitudes of dopant incorporation efficiencies for nitrogen, phosphorus, and boron in 6H-SiC (0001) Si-face epitaxial layers are compared as a function of the site-competition effect and the dopant-source reactor concentrations. This serves as a first approximation for comparison of the relative 'doping potencies' of some common dopants used in SiC CVD epitaxial growth.

Larkin, D. J.↗
NASA NTRS1995

Effects of Surface Treatments on Secondary Electron Emission from CVD Diamond Films

Secondary electron emission (SEE) properties of polycrystalline diamond films grown by chemical vapor deposition (CVD) were measured. The total secondary yield (sigma) from as-grown samples was observed to be as high as 20 at room temperature and 48 while heating at 700 K in vacuum. Electron-beam-activated, alkali-terminated diamond films have shown stable values of sigma as high as 60 when coated with CsI and similarly high values when coated with other alkali halides. Diamond coated with BaF2 had a stable sigma of 6, but no enhancement of the SEE properties was observed with coatings of Ti or Au. Hydrogen was identified to give rise to this effect in as-grown films. However, electron beam exposure led to a reduction in sigma values as low as 2. Exposure to a molecular hydrogen environment restored sigma to its original value after degradation, and enabled stable secondary emission during electron beam exposure. Atomic hydrogen and hydrogen plasma treatments were performed on diamond/Mo samples in an attempt to increase the near-surface hydrogen concentration which might lead to increased stability in the secondary emission. Raman scattering analysis, scanning electron microscopy, and Auger electron spectroscopy (AES) confirmed that hydrogen plasma and atomic hydrogen treatments improved the quality of the CVD diamond significantly. Elastic recoil detection (ERD) showed that heating as-grown diamond targets to 7OO K, which was correlated with an increase in sigma, removed contaminants from the surface but did not drive hydrogen from the diamond bulk. ERD showed that the hydrogen plasma treatment produced an increase in the hydrogen concentration in the near-surface region which did not decrease while heating in vacuum at 700 K, but no improvement in the SEE properties was observed.

Mearini, G. T.↗
NASA NTRS1998

CVD Diamond, DLC, and c-BN Coatings for Solid Film Lubrication

When the main criteria for judging coating performance were coefficient of friction and wear rate, which had to be less than 0.1 and 10(exp -6) mm(exp 3)/N-m, respectively, carbon- and nitrogen-ion-implanted, fine-grain CVD diamond and DLC ion beam deposited on fine-grain CVD diamond met the requirements regardless of environment (vacuum, nitrogen, and air).

Miyoshi, Kazuhisa↗
NASA NTRS1998

CVD Diamond, DLC, and c-BN Coatings for Solid Film Lubrication

The main criteria for judging coating performance were coefficient of friction and wear rate, which had to be less than 0.1 and 10(exp -6) cubic MM /(N*m), respectively. Carbon- and nitrogen-ion-implanted, fine-grain, chemical-vapor-deposited (CVD) diamond and diamondlike carbon (DLC) ion beam deposited on fine-grain CVD diamond met the criteria regardless of environment (vacuum, nitrogen, and air).

Miyoshi, Kazuhisa↗
NASA NTRS1999

Tribological Characteristics and Applications of Superhard Coatings: CVD Diamond, DLC, and c-BN

Results of fundamental research on the tribological properties of chemical-vapor-deposited (CVD) diamond, diamondlike carbon, and cubic boron nitride films in sliding contact with CVD diamond in ultrahigh vacuum, dry nitrogen, humid air, and water are discussed. Furthermore, the actual and potential applications of the three different superhard coatings in the field of tribology technology, particularly for wear parts and tools, are reviewed.

Miyoshi, Kazuhisa↗
NASA NTRS1998

Far Ultraviolet and Visible Light Scatter Measurements for CVD Silicon Carbide Mirrors for SOHO

Chemically-vapor-deposited (CVD) silicon carbide (SiC) has become a popular mirror material for spaceborne solar instrumentation for the vacuum ultraviolet wavelength range due to its appreciable broadband reflectance and favorable thermal and opto-mechanical properties. Scatter from surfaces of mirrors operating in this wavelength range can destroy otherwise good image contrast especially for extended targets such as the sun. While visible light scatter measurements are relatively easy to conduct, far ultraviolet (FUV) scatter measurements are not so easy. Visible light (633 nm) scatter measurements were performed on CVD SiC telescope mirrors (from the same vendor) for two instruments on the Solar and Heliospheric Observatory (SOHO) -- Ultraviolet Coronagraph Spectrometer (UVCS) and Solar Ultraviolet Measurement of Emitted Radiation (SUMER). Additionally, extensive FUV scatter measurements were made for SUMER telescope mirrors. We attempt to correlate the results for those visible light scatter measurements and to explore the usefulness of visible scatter measurements to predictions of FUV scatter for this important material.

Leviton, Douglas B.↗
NASA NTRS1999

CVD Rhenium Engines for Solar-Thermal Propulsion Systems

Solar-thermal upper-stage propulsion systems have the potential to provide specific impulse approaching 900 seconds, with 760 seconds already demonstrated in ground testing. Such performance levels offer a 100% increase in payload capability compared to state-of-the-art chemical upper-stage systems, at lower cost. Although alternatives such as electric propulsion offer even greater performance, the 6- to 18- month orbital transfer time is a far greater deviation from the state of the art than the one to two months required for solar propulsion. Rhenium metal is the only material that is capable of withstanding the predicted thermal, mechanical, and chemical environment of a solar-thermal propulsion device. Chemical vapor deposition (CVD) is the most well-established and cost-effective process for the fabrication of complex rhenium structures. CVD rhenium engines have been successfully constructed for the Air Force ISUS program (bimodal thrust/electricity) and the NASA Shooting Star program (thrust only), as well as under an Air Force SBIR project (thrust only). The bimodal engine represents a more long-term and versatile approach to solar-thermal propulsion, while the thrust-only engines provide a potentially lower weight/lower cost and more near-term replacement for current upper-stage propulsion systems.

Williams, Brian E.↗
NASA NTRS1999

Predicted Variations in Flow Patterns in a Horizontal CVD Reactor

Expressions in terms of common reactor operating parameters were derived for the ratio of the Grashof number to the Reynolds number, Gr/Re, the ratio of the Grashof to the square of 2 the Reynolds number, Gr/Re(exp 2), and the Rayleigh number, Ra. Values for these numbers were computed for an example horizontal CVD reactor and compared to numerical simulations to gauge their effectiveness as predictors of the presence or absence of transverse and longitudinal rolls in the reactor. Comparisons were made for both argon and hydrogen carrier gases over the pressure range 2- 101 kPa. Reasonable agreement was achieved in most cases when using Gr/Re to predict the presence of transverse rolls and Ra to predict the presence of longitudinal rolls. The ratio Gr/Re(exp 2) did not yield useful predictions regarding the presence of transverse rolls. This comparison showed that the ratio of the Grashof number to the Reynolds number, as well as the Rayleigh number, can be used to predict the presence or absence of transverse and longitudinal rolls in a horizontal CVD reactor for a given set of reactor conditions. These predictions are approximate, and care must be exercised when making predictions near transition regions.

Kuczmarski, Maria A.↗
NASA NTRS2001

Synthesis of Carbon Nanotubes Array by CVD

Since the properties of multi-wall carbon nanotubes (MWCNT) are superior in many devices such as electronics and sensors, many efforts have been involved in synthesizing particular structural or dimensional MWCNT. Uniform aligned MWCNT array is one of the prototype structures for devices such as filed emission device and microelectromechanical systems in which a large length to diameter ratio may also be required. Most aligned MWCNT recently synthesized by plasma enhanced chemical vapor deposition (CVD) have cone shaped structures. This presentation will illustrate aligned MWCNT array synthesized on silicon substrates using thermal CVD that could produce MWCNT with uniform diameter. An array of nickel particles was used as catalyst for MWCNT growth. A thin Ti or Au buffer layer was coated on the substrate prior to depositing nickel particles. Because the MWCNT size depends on the catalyst particle size, the nickel particle size annealed at various temperatures was investigated. MWCNT were grown on the substrate in the temperature range of 700 C - 1000 C and the pressure range of 1 to 300 torr. Methane and hydrogen gases with methane content of 1 - 10 % were used for the MWCNT synthesis. Morphology, length and diameter of MWCNT were determined by scanning electron microscopy and Raman spectroscopy. The detailed results of synthesis and characterizations will be discussed in the presentation.

Zhu, S.↗
NASA NTRS2003

CVD Growth of Carbon Nanotubes: Structure, Catalyst, and Growth

Carbon nanotubes (CNTs) exhibit extraordinary mechanical and unique electronic properties and hence have been receiving much attention in recent years for their potential in nanoelectronics, field emission devices, scanning probes, high strength composites and many more applications. Catalytic decomposition of hydrocarbon feedstock with the aid of supported transition metal catalysts - also known as chemical vapor deposition (CVD) - has become popular to produce single-walled and multi-walled nanotubes (SWNTs, MWNTs) and multiwalled nanofibers (MWNFs). The ability to grow CNTs on patterned substrates and in vertically aligned arrays, and the simplicity of the process, has made CVD growth of CNTs an attractive approach.

Delzeit, Lance↗
NASA NTRS1995

Chemical Vapor-Deposited (CVD) Diamond Films for Electronic Applications

Diamond films have a variety of useful applications as electron emitters in devices such as magnetrons, electron multipliers, displays, and sensors. Secondary electron emission is the effect in which electrons are emitted from the near surface of a material because of energetic incident electrons. The total secondary yield coefficient, which is the ratio of the number of secondary electrons to the number of incident electrons, generally ranges from 2 to 4 for most materials used in such applications. It was discovered recently at the NASA Lewis Research Center that chemical vapor-deposited (CVD) diamond films have very high secondary electron yields, particularly when they are coated with thin layers of CsI. For CsI-coated diamond films, the total secondary yield coefficient can exceed 60. In addition, diamond films exhibit field emission at fields orders of magnitude lower than for existing state-of-the-art emitters. Present state-of-the-art microfabricated field emitters generally require applied fields above 5x10^7 V/cm. Research on field emission from CVD diamond and high-pressure, high-temperature diamond has shown that field emission can be obtained at fields as low as 2x10^4 V/cm. It has also been shown that thin layers of metals, such as gold, and of alkali halides, such as CsI, can significantly increase field emission and stability. Emitters with nanometer-scale lithography will be able to obtain high-current densities with voltages on the order of only 10 to 15 V.

Source record↗
NASA NTRS2013

Advances in the Development of a WCl6 CVD System for Coating UO2 Powders with Tungsten

W-UO2 CERMET fuels are under development to enable Nuclear Thermal Propulsion (NTP) for deep space exploration. Research efforts with an emphasis on fuel fabrication, testing, and identification of potential risks is underway. One primary risk is fuel loss due to CTE mismatch between W and UO2 and the grain boundary structure of W particles resulting in higher thermal stresses. Mechanical failure can result in significant reduction of the UO2 by hot hydrogen. Fuel loss can be mitigated if the UO2 particles are coated with a layer of high density tungsten before the consolidation process. This paper discusses the work to date, results, and advances of a fluidized bed chemical vapor deposition (CVD) system that utilizes the H2-WCl6 reduction process. Keywords: Space, Nuclear, Thermal, Propulsion, Fuel, CERMET, CVD, Tungsten, Uranium

Mireles, Omar R.↗
NASA NTRS2015

Optimization of a Wcl6 CVD System to Coat UO2 Powder with Tungsten

In order to achieve deep space exploration via Nuclear Thermal Propulsion (NTP), Marshall Space Flight Center (MSFC) is developing W-UO2 CERMET fuel elements, with focus on fabrication, testing, and process optimization. A risk of fuel loss is present due to the CTE mismatch between tungsten and UO2 in the W-60vol%UO2 fuel element, leading to high thermal stresses. This fuel loss can be reduced by coating the spherical UO2 particles with tungsten via H2/WCl6 reduction in a fluidized bed CVD system. Since the latest incarnation of the inverted reactor was completed, various minor modifications to the system design were completed, including an inverted frit sublimer. In order to optimize the parameters to achieve the desired tungsten coating thickness, a number of trials using surrogate HfO2 powder were performed. The furnace temperature was varied between 930 C and 1000degC, and the sublimer temperature was varied between 140 C and 200 C. Each trial lasted 73-82 minutes, with one lasting 205 minutes. A total of 13 trials were performed over the course of three months, two of which were re-coatings of previous trials. The powder samples were weighed before and after coating to roughly determine mass gain, and Scanning Electron Microscope (SEM) data was also obtained. Initial mass results indicated that the rate of layer deposition was lower than desired in all of the trials. SEM confirmed that while a uniform coating was obtained, the average coating thickness was 9.1% of the goal. The two re-coating trials did increase the thickness of the tungsten layer, but only to an average 14.3% of the goal. Therefore, the number of CVD runs required to fully coat one batch of material with the current configuration is not feasible for high production rates. Therefore, the system will be modified to operate with a negative pressure environment. This will allow for better gas mixing and more efficient heating of the substrate material, yielding greater tungsten coating per trial.

Belancik, Grace A.↗
NASA NTRS1993

Tractable Chemical Models for CVD of Silicon and Carbon

Tractable chemical models are validated for the CVD of silicon and carbon. Dilute silane (SiH4) and methane (CH4) in hydrogen are chosen as gaseous precursors. The chemical mechanism for each systems Si and C is deliberately reduced to three reactions in the models: one in the gas phase and two at the surface. The axial-flow CVD reactor utilized in this study has well-characterized flow and thermal fields and provides variable deposition rates in the axial direction. Comparisons between the experimental and calculated deposition rates are made at different pressures and temperatures.

Blanquet, E.↗
NASA NTRSDate not supplied

Enhancing the Sensitivity of Redox Detection in Search-for-Life Missions Using Chemical Vapor Deposition (CVD) Graphene Electrodes

The primary objective for this effort is to fabricate and characterize redox-active molecules using CVD graphene as working electrodes using standard "on-chip" lithographic techniques. We then plan to move away from “on-chip” graphene electrodes and study methods for CVD graphene transfer that can also accommodate in-space manufacturing (ISM), enabling the use of this technology for crewed mission operations of the future.

graphene↗