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All sourcesNASA NTRSDOE OSTI
DOE OSTI2025

Mask-side Hyper-NA EUV imaging on the SHARP microscope

Hyper-NA, the prospective successor to high-numerical aperture (NA) extreme ultraviolet lithography (EUVL) could be inserted soon after 2030. Hyper-NA poses a number of challenges, including reduced depth of focus, amplified mask three-dimensional effects, and increased mask-side angular range. A Hyper-NA capable extreme ultraviolet (EUV) mask-imaging tool can address these challenges and accelerate research and development toward Hyper-NA. The Sharp High-Numerical Aperture Actinic Reticle Review Project (SHARP) EUV mask microscope is supporting mask-side high-NA imaging since 2015. Implementing mask-side Hyper-NA imaging in 2024 enables research and development toward the corresponding nodes of EUVL. Hyper-NA zoneplates at 0.75 4x/8x NA with a 6.7-deg chief ray angle and 0.85 4x/8x NA with a 7.4-deg chief ray angle are added to the SHARP microscope. Imaging at mask-side Hyper-NA is demonstrated. Imaging of 5-nm half-pitch (wafer scale) horizontal lines and spaces is demonstrated using dipole illumination. Imaging of 5-nm half-pitch (wafer scale) vertical lines and spaces is demonstrated using frequency-doubled imaging of 40-nm hp (mask scale) lines and spaces. Normalized image log slope (NILS) and modulation of Hyper-NA image data match closely to simulations for horizontal lines and spaces. A reduction in NILS of 0.3 or less is observed for vertical lines and spaces in the two-beam imaging regime. Through-focus image data are discussed, comparing different dipole sources and mask-side NAs. Mask-side Hyper-NA photomask imaging has been implemented and demonstrated on the SHARP microscope and is now available to users of the instrument.

Benk, Markus↗
NASA NTRS2019

Oro-Nasal Mask Versus Two-Way Non-Rebreathing Valves for Maximal Aerobic Capacity Testing in Astronauts

Astronauts complete maximal aerobic capacity (VO2pk) testing as part of their annual fitness assessment (AFA) as well as several times once assigned to an International Space Station mission. Historically, the 2-Way T-Shape Non-Rebreathing valve with a mouthpiece and nose clip (“Mouthpiece”) has been used in these tests. The testing procedure was updated to use the oro-nasal mask (“Mask”) for the AFA starting in June 2017. Astronauts who used the mask during their AFA requested it be certified to be used for all mission associated tests. Considering the criticality of the data and the schedule constraints of astronauts, it is imperative that the requested hardware change provide data with equivalent reliability and repeatability as provided by the mouthpiece. PURPOSE: To assess the reliability and validity of mask vs. mouthpiece by comparing submaximal and VO2pkdata within subjects (approximately 1 year apart). METHODS: Each of 17 active astronauts completed a VO (sub 2pk) test with the mouthpiece (first) and the mask (second) for their AFA. The VO (sub 2pk) test was conducted on a cycle ergometer with a metabolic cart. The nominal protocol started with a 3-minute warm-up at 50 Watts (W) and increased 25W every minute until volitional fatigue (Light: 45W start; 15W increase). The VO (sub 2pk)s were compared between tests and the expected day-to-day variation (plus or minus 5 percent) was used as the threshold for determining agreement between tests. Submaximal values were plotted and evaluated visually for deviations between mask and mouthpiece. RESULTS: VO (sub 2pk) values were more than 5 percent different, despite similar test times, between mouthpiece and mask in 6 of 17 comparisons, 3 of which were higher with the mask (9.0 plus or minus 5.9 percent) while 3 were lower (minus10.8 plus or minus 2.0 percent) with the mask. The submaximal data did not indicate a leak in either apparatus during these tests. An Astronaut Strength & Conditioning Rehabilitation specialist confirmed that the measured differences in VO (sub 2pk) of these 6 astronauts was consistent with observed changes in exercise habits during the year that separated the two tests. CONCLUSION: After being presented with the results of this data mining effort the mask was accepted for use in all tests, excepting that, if a leak is detected without resolve, the test will be repeated (if schedule allows) and remaining tests will be completed with the mouthpiece.

Buxton, R.↗
NASA NTRS2020

Time-Varying Ice Sheet Mask: Implications on Ice-Sheet Mass Balance and Crustal Uplift

Mass-balance estimates of the polar ice sheets presently rely on static ice masks to identify the area under investigation. However, the vintage of available ice masks can differ by more than a decade and the resolution of the imagery used to delineate ice extent can differ by an order of magnitude, despite evidence of ongoing ice-sheet retreat. We show that using a fine resolution, time-varying ice mask significantly improves mass-balance estimates of the northwestern sector of the Greenland Ice Sheet and affects interpretation of local crustal uplift. Accounting for ice margin retreat using a time-varying ice mask between 2003–2015 results in 1.0–6.8% less ice-sheet mass loss relative to assuming one of several existing static ice masks. This indicates that mass-balance estimates that use a static ice mask will progressively overestimate mass loss where the ice sheet is predominantly retreating, meaning a negative bias on mass-balance. This trend is anticipated to be amplified in a future warming scenario unless updated ice masks are incorporated. For altimetry-derived mass-balance estimates, this ice-mask induced bias approaches the magnitude of the ice-sheet-wide uncertainty presently associated with spatiotemporal variability in modeled firn compaction. Further, at five GNET stations, the ice-mask-induced bias is equivalent to 5–15% of the modeled uplift due to elastic deformation. Given present and projected negative trends in Greenland Ice Sheet mass-balance and areal extent, we conclude that studies of its mass-balance should begin incorporating dynamic, periodically updated, fine-resolution ice masks. This methodological refinement will reduce bias in estimates of both ice-sheet mass-balance and crustal uplift.

Kristian K. Kjeldsen↗
DOE OSTI2020

ScAIN etch mask for highly selective etching

A fabrication process employing the use of ScAlN as an etch mask is disclosed. The ScAlN etch mask is chemically nonvolatile in fluorine-based etch chemistries and has a low sputter yield, resulting in greater etch mask selectivity and reduced surface roughness for silicon and other semiconductor materials. The ScAlN etch mask has an etch mask selectivity of greater than 200,000:1 relative to silicon compared to an etch mask selectivity of less than 40,000:1 for a prior art AlN etch mask relative to silicon. Further, due to reduced sputtering of the ScAlN etch mask, and thus reduced micromasking, the ScAlN etch mask yielded a surface roughness of 0.6 μm compared to a surface roughness of 2.8 μm for an AlN etch mask.

36 MATERIALS SCIENCE↗
DOE OSTI2021

Mask Free OLED Fabrication Process for Non-Tunable and Tunable White OLED Panels

In this program we demonstrated a method for mask free fabrication of OLEDs. Conventional OLEDs use at least 2 shadowmasks during the fabrication process to define the deposition pattern for the organic layers and for the cathode layer. Although effective, the use of masks requires mask handling and mask change equipment which increases the cost of the OLED deposition system. New sets of masks are required for every new product design, and the mask sets require frequent cleaning as organic material builds up on the masks over time and can be a source of particle defects resulting in yield loss. The method investigated in this program uses laser removal of organic material to pattern the organic layers and define a moisture impermeable seal region. This method is digital and can be applied to any new panel design, avoiding the costs of new masks sets and associated yield loss. In addition, we developed a platform technology for producing white color tunable or dim-to-warm white OLEDs and demonstrated patterning of tunable white OLEDs using the low-cost mask free fabrication process.

32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATI↗
NASA NTRS2014

Performance of an Achromatic Focal Plane Mask for Exoplanet Imaging Coronagraphy

Coronagraph technology combined with wavefront control is close to achieving the contrast and inner working angle requirements in the lab necessary to observe the faint signal of an Earth-like exoplanet in monochromatic light. An important remaining technological challenge is to achieve high contrast in broadband light. Coronagraph bandwidth is largely limited by chromaticity of the focal plane mask, which is responsible for blocking the stellar PSF. The size of a stellar PSF scales linearly with wavelength; ideally, the size of the focal plane mask would also scale with wavelength. A conventional hard-edge focal plane mask has a fixed size, normally sized for the longest wavelength in the observational band to avoid starlight leakage. The conventional mask is oversized for shorter wavelengths and blocks useful discovery space. Recently we presented a solution to the size chromaticity challenge with a focal plane mask designed to scale its effective size with wavelength. In this paper, we analyze performance of the achromatic size-scaling focal plane mask within a Phase Induced Amplitude Apodization (PIAA) coronagraph. We present results from wavefront control around the achromatic focal plane mask, and demonstrate the size-scaling effect of the mask with wavelength. The edge of the dark zone, and therefore the inner working angle of the coronagraph, scale with wavelength. The achromatic mask enables operation in a wider band of wavelengths compared with a conventional hard-edge occulter.

Focal Plane Mask↗
NASA NTRS1995

Spatial and Spatial Frequency Spreads of Masking: Measurements and A Contrast-Gain-Control Model

Masked pattern detection is affected by the mask's proximity to the target in both the spatial and the spatial frequency domains. We measured contrast thresholds for detection of a Gabor patch centered in a sample of static band-pass noise with a central noise-free aperture. To examine spatial spread, target and mask frequency were identical, at either 2, 4, or 8 cycles/degree (cpd), and the radius of the aperture was 0, 1/2 or 1 cycle of the noise band's center frequency. The results suggest that the spatial spread of masking is scale invariant, with the largest radius producing little masking. To examine spatial frequency spread, a radius of 0 (no aperture) was used with all pairings of 2, 4, and 8 cpd for target and mask. The results suggest that masking is asymmetrical over log frequency: 8 z 0 cpd noise masks a 2 cpd target, but 2 cpd noise does not mask an 8 cpd target. We have used these results to calibrate a model of contrast-gain-control.

Solomon, Joshua A.↗
NASA NTRS1995

Spatial and Spatial Frequency Spreads Of Masking: Measurements and a Contrast-Gain-Control Model

Masked pattern detection is affected by the mask's proximity to the target in both the spatial and the spatial frequency domains. We measured contrast thresholds for detection of a Gabor patch centered in a sample of static band-pass noise with a central noise-free aperture. To examine spatial spread, target and mask frequency were identical, at either 2, 4, or 8 cycles/degree (cpd), and the radius of the aperture was 0, 1/2 or 1 cycle of the noise band's center frequency. The results suggest that the spatial spread of masking is scale invariant, with the largest radius producing little masking. To examine spatial frequency spread, a radius of 0 (no aperture) was used with all pairings of 2,4, and 8 cpd for target and mask. The results suggest that masking is asymmetrical over log frequency: 8 cpd noise masks a 2 cpd target, but 2 cpd noise does not mask an 8 cpd target. We have used these results to calibrate a model of contrast-gain-control.

Solomon, J. A.↗
NASA NTRS2004

Improved Phase-Mask Fabrication of Fiber Bragg Gratings

An improved method of fabrication of Bragg gratings in optical fibers combines the best features of two prior methods: one that involves the use of a phase mask and one that involves interference between the two coherent laser beams. The improved method affords flexibility for tailoring Bragg wavelengths and bandwidths over wide ranges. A Bragg grating in an optical fiber is a periodic longitudinal variation in the index of refraction of the fiber core. The spatial period (Bragg wavelength) is chosen to obtain enhanced reflection of light of a given wavelength that would otherwise propagate relatively unimpeded along the core. Optionally, the spatial period of the index modulation can be made to vary gradually along the grating (such a grating is said to be chirped ) in order to obtain enhanced reflection across a wavelength band, the width of which is determined by the difference between the maximum and minimum Bragg wavelengths. In the present method as in both prior methods, a Bragg grating is formed by exposing an optical fiber to an ultraviolet-light interference field. The Bragg grating coincides with the pattern of exposure of the fiber core to ultraviolet light; in other words, the Bragg grating coincides with the interference fringes. Hence, the problem of tailoring the Bragg wavelength and bandwidth is largely one of tailoring the interference pattern and the placement of the fiber in the interference pattern. In the prior two-beam interferometric method, a single laser beam is split into two beams, which are subsequently recombined to produce an interference pattern at the location of an optical fiber. In the prior phase-mask method, a phase mask is used to diffract a laser beam mainly into two first orders, the interference between which creates the pattern to which an optical fiber is exposed. The prior two-beam interferometric method offers the advantage that the period of the interference pattern can be adjusted to produce gratings over a wide range of Bragg wavelengths, but offers the disadvantage that success depends on precise alignment and high mechanical stability. The prior phase-mask method affords the advantages of compactness of equipment and relative insensitivity to both misalignment and vibration, but does not afford adjustability of the Bragg wavelength. The present method affords both the flexibility of the prior two-beam interferometric method and the compactness and stability of the prior phase-mask method. In this method (see figure), a laser beam propagating along the x axis is normally incident on a phase mask that lies in the (y,z) plane. The phase of light propagating through the mask is modulated with a spatial periodicity, p, along the y axis chosen to diffract the laser light primarily to first order at the angle . (The zero-order laser light propagating along the x axis can be used for alignment and thereafter suppressed during exposure of the fiber.) The diffracted light passes through a concave cylindrical lens, which converts the flat diffracted wave fronts to cylindrical ones, as though the light emanated from a line source. Then two parallel flat mirrors recombine the diffracted beams to form an interference field equivalent to that of two coherent line sources at positions A and B (virtual sources). The interference pattern is a known function of the parameters of the apparatus and of position (x,y) in the interference field. Hence, the tilt, wavelength, and chirp of the Bragg grating can be chosen through suitable adjustments of the apparatus and/or of the position and orientation of the optical fiber. In particular, the Bragg wavelength can be adjusted by moving the fiber along the x axis, and the bandwidth can be modified over a wide range by changing the fiber tilt angle or by moving the phase mask and/or the fiber. Alignment is easy because the zero-order beam defines the x axis. The interference is relatively stable and insensitive to the mechanical vibration because of the gh symmetry and compactness of the apparatus, the fixed positions of the mirrors and lens, and the consequent fixed positions of the two virtual line sources, which are independent of the translations of the phase mask and the laser relative to the lens.

Grant, Joseph↗
NASA NTRS2012

Coronagraph Focal-Plane Phase Masks Based on Photonic Crystal Technology: Recent Progress and Observational Strategy

Photonic crystal, an artificial periodic nanostructure of refractive indices, is one of the attractive technologies for coronagraph focal-plane masks aiming at direct imaging and characterization of terrestrial extrasolar planets. We manufactured the eight-octant phase mask (8OPM) and the vector vortex mask (VVM) very precisely using the photonic crystal technology. Fully achromatic phase-mask coronagraphs can be realized by applying appropriate polarization filters to the masks. We carried out laboratory experiments of the polarization-filtered 8OPM coronagraph using the High-Contrast Imaging Testbed (HCIT), a state-of-the-art coronagraph simulator at the Jet Propulsion Laboratory (JPL). We report the experimental results of 10-8-level contrast across several wavelengths over 10% bandwidth around 800nm. In addition, we present future prospects and observational strategy for the photonic-crystal mask coronagraphs combined with differential imaging techniques to reach higher contrast. We proposed to apply a polarization-differential imaging (PDI) technique to the VVM coronagraph, in which we built a two-channel coronagraph using polarizing beam splitters to avoid a loss of intensity due to the polarization filters. We also proposed to apply an angular-differential imaging (ADI) technique to the 8OPM coronagraph. The 8OPM/ADI mode avoids an intensity loss due to a phase transition of the mask and provides a full field of view around central stars. We present results of preliminary laboratory demonstrations of the PDI and ADI observational modes with the phase-mask coronagraphs.

coronagraphy↗
DOE OSTI2020

Durability of Disposable N95 Mask Material When Exposed to Improvised Ozone Gas Disinfection

The principle finding of this report is that both commercial and a novel material used for N95 mask filters can endure many cycles of disinfection by ozone gas (20 ppm for 30 minutes) without detectable degradation or loss of filtration efficiency. N95 masks and surgical masks (hereafter referred to as masks) typically use a filtration material fabricated from meltblown polypropylene. To achieve maximum filtration efficiency while maintaining a reasonable pressure drop, these nonwoven fabrics are also electrostatically charged (corona discharge is the most common method used), to maximize attraction and capture of aerosols and solid particulates. Under normal circumstances, the reuse of masks is generally discouraged, but in times of crisis has become a necessity, making disinfection after each use a necessity. To be acceptable, any disinfection procedure must cause minimal degradation to the performance of the filter material. Possible performance degradation mechanisms include mechanical damage, loss of electrostatic charge, or both. One of the most practical and direct ways to measure combined mechanical and electrostatic integrity, and the subsequent ability to reuse mask filter material, is by the direct measurement of filtration efficiency. In this paper, we report that small numbers of disinfection cycles at reasonable virucidal doses of ozone do not significantly degrade the filtration efficiency of meltblown polypropylene filter material. By comparison, laundering quickly results in a significant loss of filtration efficiency and requires subsequent recharging to restore the electrostatic charge and filtration efficiency. A common assumption among biomedical scientists that ozone is far too destructive for this application. However, these direct measurements show that mask materials, specifically the filtration material, can withstand dozens of ozone disinfection cycles without any measurable degradation of filtration efficiency, nor any visible discoloration or loss of fiber integrity. The data are clear: when subjected to a virucidal dose of ozone for a much longer duration than is required for viral inactivation, there was no degradation of N95 filtration efficiency. The specific dosages of ozone needed for ~99% viral inactivation are thought to be at least 10 ppm for up to 30 minutes based upon an extensive literature review, but to standardize our testing, we consider a dose of 20 ppm for 30 minutes to be a reasonable and conservatively high ozone disinfection cycle. Finally, the material tested in this study withstood dosages of up to 200 ppm for 90 minutes, or alternatively 20 ppm for up to 36 hours, without detectable degradation, and further testing suggests that up to 30 or more disinfection cycles (at 20 ppm for 30 minutes) would result in less than a 5% loss of filtration efficiency. This report does not address the effect of ozone cycling on other mask components, such as elastics.

60 APPLIED LIFE SCIENCES↗
DOE OSTI2018

Masking of a High-Reflectivity Sphere by a Layer with a Random Quasi-Zero Refractive Index

The method of masking of a large-radius sphere made of an arbitrary material by a masking coating with a random quasi-zero refractive index is substantiated theoretically and experimentally. In this method of masking, the sphere is first coated with a mirror layer (e.g., high-reflectivity silver) and then with a masking layer with a thickness much smaller than the radius of the sphere. The fraction of the external radiation intensity bending around the sphere at the points of observation near the surface of the sphere and the extinction cross section of the sphere with the masking coating for points of observation far away from the sphere are calculated. It is shown that extinction cross section Q of the sphere with a masking coating is much smaller than 2D, where D is the geometrical cross section of the sphere; this corresponds to the masking effect for the sphere in the wavelength range of at least 450–1200 nm in the transparency region of the masking coating.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗
NASA NTRS2009

Computing Challenges in Coded Mask Imaging

This slide presaentation reviews the complications and challenges in developing computer systems for Coded Mask Imaging telescopes. The coded mask technique is used when there is no other way to create the telescope, (i.e., when there are wide fields of view, high energies for focusing or low energies for the Compton/Tracker Techniques and very good angular resolution.) The coded mask telescope is described, and the mask is reviewed. The coded Masks for the INTErnational Gamma-Ray Astrophysics Laboratory (INTEGRAL) instruments are shown, and a chart showing the types of position sensitive detectors used for the coded mask telescopes is also reviewed. Slides describe the mechanism of recovering an image from the masked pattern. The correlation with the mask pattern is described. The Matrix approach is reviewed, and other approaches to image reconstruction are described. Included in the presentation is a review of the Energetic X-ray Imaging Survey Telescope (EXIST) / High Energy Telescope (HET), with information about the mission, the operation of the telescope, comparison of the EXIST/HET with the SWIFT/BAT and details of the design of the EXIST/HET.

Skinner, Gerald↗
NASA NTRS2011

Reflective Occultation Mask for Evaluation of Occulter Designs for Planet Finding

Advanced formation flying occulter designs utilize a large occulter mask flying in formation with an imaging telescope to block and null starlight to allow imaging of faint planets in exosolar systems. A paper describes the utilization of subscale reflective occultation masks to evaluate formation flying occulter designs. The use of a reflective mask allows mounting of the occulter by conventional means and simplifies the test configuration. The innovation alters the test set-up to allow mounting of the mask using standard techniques to eliminate the problems associated with a standard configuration. The modified configuration uses a reflective set-up whereby the star simulator reflects off of a reflective occulting mask and into an evaluation telescope. Since the mask is sized to capture all rays required for the imaging test, it can be mounted directly to a supporting fixture without interfering with the beam. Functionally, the reflective occultation mask reflects light from the star simulator instead of transmitting it, with a highly absorptive carbon nanotube layer simulating the occulter blocking mask. A subscale telescope images the star source and companion dim source that represents a planet. The primary advantage of this is that the occulter can be mounted conventionally instead of using diffractive wires or magnetic levitation.

Hagopian, John↗
NASA NTRS2016

Development of an Operational Land Water Mask for MODIS Collection 6, and Influence on Downstream Data Products

Data from the Moderate Resolution Imaging Spectro-radiometer (MODIS)on-board the Earth Observing System Terra and Aqua satellites are processed using a land water mask to determine when an algorithm no longer needs to be run or when an algorithm needs to follow a different pathway. Entering the fourth reprocessing (Collection 6 (C6)) the MODIS team replaced the 1 km water mask with a 500 m water mask for improved representation of the continental surfaces. The new water mask represents more small water bodies for an overall increase in water surface from 1 to 2 of the continental surface. While this is still a small fraction of the overall global surface area the increase is more dramatic in certain areas such as the Arctic and Boreal regions where there are dramatic increases in water surface area in the new mask. MODIS products generated by the on-going C6 reprocessing using the new land water mask show significant impact in areas with high concentrations of change in the land water mask. Here differences between the Collection 5 (C5) and C6 water masks and the impact of these differences on the MOD04 aerosol product and the MOD11 land surface temperature product are shown.

Carroll, M. L.↗
NASA NTRSDate not supplied

Multi-Star Wavefront Control at the Occulting Mask Coronagraph Testbed: Monochromatic Laboratory Demonstration for the Roman Coronagraph Instrument

The Astro2020 decadal survey recommended a direct imaging flagship mission with a goal for mission yield of 25 or more potentially habitable exoplanets. A majority of Sun-like stars have a stellar companion that can introduce additional noise into the field of view of any high-contrast imaging instrument and enabling exoplanet discovery around binary stars represents a path to increased coronagraphic instrument efficiency. This includes both of the Alpha Centauri A and B stars which would represent the top science target for direct imaging if companion leakage can be suppressed. Multi-Star Wavefront Control (MSWC) is a technique that removes stellar leakage from both stellar components, enabling direct imaging of exoplanets in many binary star systems. We present the latest testbed results obtained with MSWC as part of the technology development effort focusing on demonstrations conducted on the Occulting Mask Coronagraph (OMC) testbed at JPL. OMC has a layout similar to the Roman Space Telescope coronagraph instrument (CGI) and is outfitted with a MSWC mask with the same design as the contributed mask for the Roman CGI. Our testbed results represent the first demonstrations of this technique using the recently installed full binary source for a geometry matching potential Alpha Centauri observations. Technical Review Abstract: The Astro2020 decadal survey recommended a direct imaging flagship mission with a goal for mission yield of 25 or more potentially habitable exoplanets. A majority of Sun-like stars have a stellar companion that can introduce additional noise into the field of view of any high-contrast imaging instrument and enabling exoplanet discovery around binary stars represents a path to increased coronagraphic instrument efficiency by increasing the available science target pool of bright nearby stars. This includes both of the Alpha Centauri A and B stars which would represent the top science target for direct imaging if companion leakage can be suppressed. Multi-Star Wavefront Control (MSWC) is a technique that removes stellar leakage from both stellar components, enabling direct imaging of exoplanets in many binary star systems . We present the latest testbed results obtained with MSWC as part of the technology development effort focusing on demonstrations conducted on the Occulting Mask Coronagraph (OMC) testbed at JPL during the completed first vacuum window and recent results from the ongoing second vacuum window. The MSWC mask consists of a shaped pupil mask similar to the one used for the Wide-Field of View mode but also includes a set of superimposed, regularly-spaced dots that serve as a diffraction grating. OMC has a layout similar to the Roman Space Telescope coronagraph instrument (CGI) and is configured with a binary imaging mode with a MSWC mask using same design as the contributed mask for the Roman CGI. Our testbed results represent the first demonstrations of this technique using the recently installed full binary source. We present results obtained in Super-Nyquist regime demonstrating suppression in the Super-Nyquist regime for the 3rd diffraction order reaching 8.7e-9 contrast with the Roman pupil. In addition, we present results obtained with the binary-star regime demonstrating 9.6e-8 contrast for a geometry matching potential Alpha Centauri observations in a monochromatic wavelength similar to Band 1. Planned demonstrations in the 2nd vacuum window will focus on Band 3d and Band 4 using the full MSWC mode for an Alpha Centauri geometry.

High-contrast imaging↗
DOE OSTI2018

Electron beam masks for compressive sensors

Transmission microscopy imaging systems include a mask and/or other modulator situated to encode image beams, e.g., by deflecting the image beam with respect to the mask and/or sensor. The beam is modulated/masked either before or after transmission through a sample to induce a spatially and/or temporally encoded signal by modifying any of the beam/image components including the phase/coherence, intensity, or position of the beam at the sensor. For example, a mask can be placed/translated through the beam so that several masked beams are received by a sensor during a single sensor integration time. Images associated with multiple mask displacements are then used to reconstruct a video sequence using a compressive sensing method. Another example of masked modulation involves a mechanism for phase-retrieval, whereby the beam is modulated by a set of different masks in the image plane and each masked image is recorded in the diffraction plane.

36 MATERIALS SCIENCE↗
DOE OSTI2020

Aerosol Filtration Efficiency of Common Fabrics Used in Respiratory Cloth Masks

The emergence of a pandemic affecting the respiratory system can result in a significant demand for face masks. This includes the use of cloth masks by large sections of the public, as can be seen during the current global spread of COVID-19. However, there is limited knowledge available on the performance of various commonly available fabrics used in cloth masks. Importantly, there is a need to evaluate filtration efficiencies as a function of aerosol particulate sizes in the 10 nm – 10 µm range, which is particularly relevant for respiratory virus transmission. We have carried out these studies for several common fabrics including cotton, silk, chiffon, flannel, various synthetics, and their combinations. While the filtration efficiencies for various fabrics when a single layer was used ranged from 5-80% and 15-95% for particle sizes <300 nm and >300 nm respectively, the efficiencies improved when multiple layers were used, and when using a specific combination of different fabrics. Filtration efficiencies of the hybrids (such as cotton-silk, cotton-chiffon, cotton-flannel) was >80 % (for particles <300 nm) and >90 % (for particles >300 nm). We speculate that the enhanced performance of the hybrids is likely due to the combined effect of mechanical and electrostatic-based filtration. Cotton, the most widely used material for cloth masks performs better at higher weave densities (i.e., threads per inch) and can make a significant difference in filtration efficiencies. Our studies also imply that gaps (as caused by an improper fit of the mask) can result in over a 60% decrease in the filtration efficiency, implying the need for future cloth mask design studies to take into account issues of “fit” and leakage, while allowing the exhaled air to vent efficiently. Overall, we find that combinations of various commonly available fabrics used in cloth masks can potentially provide significant protection against the transmission of aerosol particles.

36 MATERIALS SCIENCE↗