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21 records · Page 2

Model Validation of Phase-Induced Amplitude Apodization Complex Mask Coronagraph for LUVOIR-A in Vacuum

The Phase-Induced Amplitude Apodization Complex Mask Coronagraph (PIAACMC) is a coronagraph architecture for the next generation of large space telescopes optimized for habitable exoplanet imaging that can achieve attractive theoretical performance with high throughput at small inner working angles (IWA). PIAACMC designs are compatible with large, on-axis, segmented apertures such as the Large UV / Optical/ Infrared A (LUVOIR-A) concept currently being considered by the decadal survey review which would greatly enhance the possibility to achieve statistically significant scientific yields and signal quality for direct imaging exoplanet surveys. PIAACMC has been recently implemented for LUVOIR-A and is currently being tested in vacuum at JPL’s High-Contrast Imaging Testbed (HCIT). In this work, we review the theoretical performance of the PIAACMC instrument designed to meet a 1e-9 raw contrast goal in 10% broadband light in a region from 2-8 L/D both before and after the wavefront control loop. We use empirical measurements from the vacuum testbed to verify the instrument model and its performance including line-of-sight errors, instrument alignment, and fabricated components. In particular, the model verification includes measured sags of the manufactured PIAA mirrors by NuTek. The CMC mask was manufactured at JPL’s Microdevices Laboratory and we include surface profile characterization measurement. We assess the impact on performance of the different manufacturing and alignment errors.

High-Contrast Imaging↗

High Contrast Internal and External Coronagraph Masks Produced by Various Techniques

Masks for high contrast internal and external coronagraphic imaging require a variety of masks depending on different architectures to suppress star light. Various fabrication technologies are required to address a wide range of needs including gradient amplitude transmission, tunable phase profiles, ultra-low reflectivity, precise small scale features, and low-chromaticity. We present the approaches employed at JPL to produce pupil plane and image plane coronagraph masks, and lab-scale external occulter type masks by various techniques including electron beam, ion beam, deep reactive ion etching, and black silicon technologies with illustrative examples of each. Further development is in progress to produce circular masks of various kinds for obscured aperture telescopes.

Phase Induced Amplitude Apodization Complex Mask C↗

Studies of the Effects of Actuator Errors on the HCIT/PIAA Contrast Performance

The High Contrast Imaging Testbed Phase Induced Amplitude Apodization (HCIT/PIAA) coronagraph system at JPL relies on an Electric-Field Conjugation (EFC) wavefront correction algorithm to obtain the required high contrast. This algorithm works with one deformable mirror (DM) to estimate the electric-field to be controlled, and with one or multiple DM's to create a "dark-hole" in the image plane. We have investigated the effects of DM actuator errors on the efficiency of the EFC algorithm. The structural design of the optical system as well as the parameters of various optical elements used in the analysis are drawn from those of the HCIT/PIAA system that have been and will be implemented with one or two DM's. The simulation takes into account the surface errors of various optical elements. In this paper, we report our findings in the case of narrowband wavelength light.

PIAA↗